Research of Laminated Photoresist Sacrificial Layer Technology and Residual Stress in Micromirror Fabrication

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Research of Laminated Photoresist Sacrificial Layer Technology and Residual Stress in Micromirror Fabrication

Article | 更新时间：2020-08-13

- Research of Laminated Photoresist Sacrificial Layer Technology and Residual Stress in Micromirror Fabrication
- Optics and Precision Engineering Vol. 16, Issue 11, Pages: 2204-2208(2008)
- 作者机构：
  
  长春光学精密机械与物理研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：07 April 2008，
  
  Revised：05 May 2008，
  
  Published Online：25 November 2008，
  
  Published：25 November 2008
- 稿件说明：
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李加东,张平,吴一辉,宣明,刘永顺,王淑荣. 用于微反射镜制作的叠层光刻胶牺牲层工艺及残余应力控制[J]. 光学精密工程, 2008,16(11):2204-2208

Research of Laminated Photoresist Sacrificial Layer Technology and Residual Stress in Micromirror Fabrication[J]. Optics and precision engineering, 2008, 16(11): 2204-2208.
李加东,张平,吴一辉,宣明,刘永顺,王淑荣. 用于微反射镜制作的叠层光刻胶牺牲层工艺及残余应力控制[J]. 光学精密工程, 2008,16(11):2204-2208 DOI：

Research of Laminated Photoresist Sacrificial Layer Technology and Residual Stress in Micromirror Fabrication[J]. Optics and precision engineering, 2008, 16(11): 2204-2208. DOI：

摘要

对应用于微反射镜制作的叠层光刻胶牺牲层工艺及微反射镜表面残余应力控制进行了研究。讨论了光刻胶牺牲层在电镀时的污染问题，提出电镀结束后重新制作光刻胶牺牲层的方法来保证牺牲层表面质量。同时提出蒸发-电镀相结合的工艺解决了上层光刻胶溶剂穿过中间结构层浸入底层光刻胶的问题，并通过控制蒸发与电镀过程中应力状态不同的两层金属薄膜的厚度解决了微反射镜镜面存在残余应力问题。最后成功释放了长620μm、宽500μm、厚2μm、悬空高为12μm的微反射镜结构。

Abstract

This paper investigates the laminated photoresist sacrificial layer technology and residual stress in micromirror fabrication. Different problems in electroplating related to the photoresist sacrificial such as pollution are discussed and their solutions are proposed．Through experiments

it was found that the solvent of the upper photoresist penetrates the electroplating base metal layers and dissolves the sacrificial layer behind it; a new fabrication process is developed. The residual stresses in thin metal films can affect the device properties. And the investigation of the residual stress origin and how to control are shown. Some valuable experimental parameters were obtained. Employing the new technologies

we fabricate perfect flat micromirror with the size of 620×500×2 μm3

air gap’s height of 12μm.

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