Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system

WANG Leijie; GUO Ziwen; YE Weinan; ZHANG Ming; ZHU Yu

doi:10.37188/OPE.20223005.0499

您当前的位置：

首页 >

文章列表页 >

Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system

Modern Applied Optics | 更新时间：2026-09-12

- Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system
- Optics and Precision Engineering Vol. 30, Issue 5, Pages: 499-509(2022)
- 作者机构：
  
  清华大学机械工程系摩擦学国家重点实验室&精密超精密制造装备及控制北京市重点实验室，北京 100084
- 作者简介：
- 基金信息：
- DOI：10.37188/OPE.20223005.0499
  CLC： TH741;TP274
- Received：25 August 2021，
  
  Revised：2021-09-24，
  
  Published：10 March 2022
- 稿件说明：
移动端阅览
王磊杰,郭子文,叶伟楠等.超精密空间分离式外差利特罗平面光栅编码器位移测量系统[J].光学精密工程,2022,30(05):499-509.

WANG Leijie,GUO Ziwen,YE Weinan,et al.Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system[J].Optics and Precision Engineering,2022,30(05):499-509.
王磊杰,郭子文,叶伟楠等.超精密空间分离式外差利特罗平面光栅编码器位移测量系统[J].光学精密工程,2022,30(05):499-509. DOI： 10.37188/OPE.20223005.0499.

WANG Leijie,GUO Ziwen,YE Weinan,et al.Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system[J].Optics and Precision Engineering,2022,30(05):499-509. DOI： 10.37188/OPE.20223005.0499.

摘要

面向浸没式光刻机双工件台的超精密位置测量应用需求，提出了一种超精密空间分离式外差利特罗平面光栅编码器位移测量系统。给出了测量系统的原理与方案设计、系统各部件的设计及制造、编码器测量原理推导及实验验证等。所设计平面光栅编码器位移测量系统的相位卡的细分率为4 096，测量分辨率为

50 pm/

25 pm。实验结果表明：该平面光栅位移测量系统可实现

向和

向位移的同时测量，

向运动行程为±1 mm，满足光刻机双工件台的垂向调焦需求；

单轴转动或三轴联合转动极限转角为±1.5 mrad时，交流信号质量仍然满足测量要求，光刻机双工件台的

的调平转动满足需求。所设计的平面光栅编码器位移测量系统能够实现光刻机双工件台相应的测量功能且具有较高的性能指标。

Abstract

An ultra-precision spatial separation heterodyne littrow grating encoder displacement measurement system was proposed to meet the requirements of an ultra-precision position measurement of dual workpiece table of immersion lithography machine. This study mainly includes the principle and scheme design of the measurement system， the design and manufacture of each component of the system， the measurement principle derivation of the encoder， and the test verification. The subdivision rate of the phase card of the displacement measurement system of the designed planar grating encoder was 4 096， and the measurement resolution was

50 pm/

25 pm. The experimental results showed that the planar grating displacement measurement system can measure the

and

direction displacement simultaneously， and the

direction motion stroke was ±1 mm， which met the vertical focusing requirements of the dual workpiece of the lithography

machine. When the limit rotation angle of

uniaxial rotation or triaxial combined rotation was ± 1.5 mrad， the AC signal quality still met the measurement requirements. Moreover， it met the requirements of

leveling rotation of the dual workpiece table of lithography machine. To summarize， the displacement measurement system of the designed planar grating encoder met the corresponding measurement requirements of the photoengraving machine dual workpiece table and achieved higher performance indexes.

关键词

Keywords

references

ZHU Y ， YIN W S ， DUAN G H . Research on ultra-precision stages of lithography ［J］. Equipment for Electronic Products Manufacturing ， 2004 ， 33 （ 2 ）： 25 - 27， 44 . （in Chinese）

DE JONG F ， PASCH BVAN DER ， CASTENMILLER T ， et al . Enabling the lithography roadmap： an immersion tool based on a novel stage positioning system ［C］. SPIE Advanced Lithography. Proc SPIE 7274 ， Optical Microlithography XXII， San Jose， California， USA . 2009 ， 7274 ： 608 - 617 . doi: 10.1117/12.814254 http://dx.doi.org/10.1117/12.814254

CASTENMILLER T ， DE MAST FVAN ， DE KORT T ， et al . Towards ultimate optical lithography with NXT： 1950i dual stage immersion platform ［C］. SPIE Advanced Lithography. Proc SPIE 7640 ， Optical Microlithography XXIII， San Jose， California， USA . 2010 ， 7640 ： 623 - 634 . doi: 10.1117/12.847025 http://dx.doi.org/10.1117/12.847025

SHIBAZAKI Y ， KOHNO H ， HAMATANI M . An innovative platform for high-throughput high-accuracy lithography using a single wafer stage ［C］. SPIE Advanced Lithography. Proc SPIE 7274 ， Optical Microlithography XXII， San Jose， California， USA . 2009 ， 7274 ： 514 - 525 . doi: 10.1117/12.813386 http://dx.doi.org/10.1117/12.813386

DE KIMURA A ， WEI G ， ARAI Y ， et al . Design and construction of a two-degree-of-freedom linear encoder for nanometric measurement of stage position and straightness ［J］. Precision Engineering ， 2010 ， 34 （ 1 ）： 145 - 155 . doi: 10.1016/j.precisioneng.2009.05.008 http://dx.doi.org/10.1016/j.precisioneng.2009.05.008

SHIBAZAKI Y . Movable body drive method and movable body drive system， pattern formation method and apparatus， exposure method and apparatus， and device manufacturing method ： CN102749812A ［P］. ［ 2012-10-24 ］.

WANG L J ， ZHANG M ， ZHU Y ， et al .. A novel heterodyne planar grating encoder system for in-plane and out-of-plane displacement measurement with nanometer-resolution ［C］. Proceedings of the 29th annual meeting of the American Society for Precision Engineering， Boston， USA ： ASPE ， 2014 ： 173 - 177 .

JITSUNO T ， MOTOKOSHI S ， OKAMOTO T ， et al . Development of 91 cm size gratings and mirrors for LEFX laser system ［J］. Journal of Physics： Conference Series ， 2008 ， 112 （ 3 ）： 032002 . doi: 10.1088/1742-6596/112/3/032002 http://dx.doi.org/10.1088/1742-6596/112/3/032002

HOLZAPFEL W . Advancements in displacement metrology based on encoder system ［C］. Proceedings of the 23th annual meeting of the American Society for Precision Engineering， Portland， USA ： ASPE ， 2008 ： 71 - 74 .

WANG L J ， ZHANG M ， ZHU Y ， et al .. Progress on scanning beam interference lithography tool with high environmental robustness for patterning large size grating with nanometre accuracy ［C］. Proceedings of the 17th annual meeting of the European Society for Precision Engineering and Nanotechnology ， Hannover， Germany ： Euspen ， 2017 ： 173 - 177 .

LEE C K ， WU C C ， CHEN S J ， et al . Design and construction of linear laser encoders that possess high tolerance of mechanical runout ［J］. Applied Optics ， 2004 ， 43 （ 31 ）： 5754 - 5762 . doi: 10.1364/ao.43.005754 http://dx.doi.org/10.1364/ao.43.005754

GUAN J ， KÖCHERT P ， WEICHERT C ， et al . A high performance one-dimensional homodyne encoder and the proof of principle of a novel two-dimensional homodyne encoder ［J］. Precision Engineering ， 2013 ， 37 （ 4 ）： 865 - 870 . doi: 10.1016/j.precisioneng.2013.05.003 http://dx.doi.org/10.1016/j.precisioneng.2013.05.003

TRUTNA W ， OWEN G ， RAY A ， et al . Littrow ineterferormeter ： US ， US7440113B2 ［P］. ［ 2008-10-21 ］.

DE GROOT P ， BADAMI V ， LIESENER J . Concepts and geometries for the next generation of precision heterodyne optical encoders ［C］. The Proceedings of 31th ASPE Anuual Metting . 2016 ： 4660 .

WANG L J ， ZHANG M ， ZHU Y ， et al . Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner ［J］. Optics and Precision Engineering ， 2019 ， 27 （ 9 ）： 1909 - 1918 . （in Chinese） . doi: 10.3788/ope.20192709.1909 http://dx.doi.org/10.3788/ope.20192709.1909

DECK L ， DE GROOT P ， SCHROEDER M . Ineterferormetric encoder system ： US ， US2011/0255096A2 ［P］. 2011-10-20 .

LIESENER J . Ineterferormetric encoder system ： US ， US2016/0102999A1 ［P］. 2016-04-11 .

DE KIMURA A ， GAO W ， KIM W ， et al . A sub-nanometric three-axis surface encoder with short-period planar gratings for stage motion measurement ［J］. Precision Engineering ， 2012 ， 36 （ 4 ）： 576 - 585 . doi: 10.1016/j.precisioneng.2012.04.005 http://dx.doi.org/10.1016/j.precisioneng.2012.04.005

SAITO Y ， ARAI Y ， GAO W . Detection of three-axis angles by an optical sensor ［J］. Sensors and Actuators A： Physical ， 2009 ， 150 （ 2 ）： 175 - 183 . doi: 10.1016/j.sna.2008.12.019 http://dx.doi.org/10.1016/j.sna.2008.12.019

LI X H ， GAO W ， MUTO H ， et al . A six-degree-of-freedom surface encoder for precision positioning of a planar motion stage ［J］. Precision Engineering ， 2013 ， 37 （ 3 ）： 771 - 781 . doi: 10.1016/j.precisioneng.2013.03.005 http://dx.doi.org/10.1016/j.precisioneng.2013.03.005

Views

1376

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner

Miniature high-precision grating displacement sensor design and error compensation

Error compensation for laser heterodyne interferometric displacement measurement based on Kalman filter

Research on optical fiber multi-wavelength laser for measuring displacement precisely

Related Author

WANG Leijie ZHANG Ming ZHU Yu YE Wei-nan YANG Fu-zhong

Fu-zhong YANG

Wei-nan YE

Yu ZHU

Ming ZHANG

Lei-jie WANG

ZHU Tao

LI Ziwen

Related Institution

State Key Laboratory of Tribology & Beijing Key Lab of Precision/Ultra-precision Manufacturing Equipments and Control, Department of Mechanical Engineering, Tsinghua University

Key Laboratory of Optoelectronic Technology & Systems （Ministry of Education）， College of Optoelectronic Engineering， Chongqing University

School of Information Science and Engineering， Zhejiang Sci-Tech University

Laboratory of Optoelectronic Information Science and Engineering, School of Science, Beijing Jiaotong University

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China Postal code：130033
Tel：0431-86176855 Email：gxjmgc@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰