Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system

Leijie WANG; Ziwen GUO; Weinan YE; Ming ZHANG; Yu ZHU

doi:10.37188/OPE.20223005.0499

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Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system

Modern Applied Optics | 更新时间：2022-03-25

- Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system
- Optics and Precision Engineering Vol. 30, Issue 5, Pages: 499-509(2022)
- 作者机构：
  
  清华大学机械工程系摩擦学国家重点实验室&精密超精密制造装备及控制北京市重点实验室，北京 100084
- 作者简介：
- 基金信息：
- DOI：10.37188/OPE.20223005.0499
  CLC： TH741;TP274
- Received：25 August 2021，
  
  Revised：24 September 2021，
  
  Published：10 March 2022
- 稿件说明：
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王磊杰,郭子文,叶伟楠等.超精密空间分离式外差利特罗平面光栅编码器位移测量系统[J].光学精密工程,2022,30(05):499-509.

WANG Leijie,GUO Ziwen,YE Weinan,et al.Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system[J].Optics and Precision Engineering,2022,30(05):499-509.
王磊杰,郭子文,叶伟楠等.超精密空间分离式外差利特罗平面光栅编码器位移测量系统[J].光学精密工程,2022,30(05):499-509. DOI： 10.37188/OPE.20223005.0499.

WANG Leijie,GUO Ziwen,YE Weinan,et al.Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system[J].Optics and Precision Engineering,2022,30(05):499-509. DOI： 10.37188/OPE.20223005.0499.

摘要

面向浸没式光刻机双工件台的超精密位置测量应用需求，提出了一种超精密空间分离式外差利特罗平面光栅编码器位移测量系统。给出了测量系统的原理与方案设计、系统各部件的设计及制造、编码器测量原理推导及实验验证等。所设计平面光栅编码器位移测量系统的相位卡的细分率为4 096，测量分辨率为

50 pm/

25 pm。实验结果表明：该平面光栅位移测量系统可实现

向和

向位移的同时测量，

向运动行程为±1 mm，满足光刻机双工件台的垂向调焦需求；

单轴转动或三轴联合转动极限转角为±1.5 mrad时，交流信号质量仍然满足测量要求，光刻机双工件台的

的调平转动满足需求。所设计的平面光栅编码器位移测量系统能够实现光刻机双工件台相应的测量功能且具有较高的性能指标。

Abstract

An ultra-precision spatial separation heterodyne littrow grating encoder displacement measurement system was proposed to meet the requirements of an ultra-precision position measurement of dual workpiece table of immersion lithography machine. This study mainly includes the principle and scheme design of the measurement system， the design and manufacture of each component of the system， the measurement principle derivation of the encoder， and the test verification. The subdivision rate of the phase card of the displacement measurement system of the designed planar grating encoder was 4 096， and the measurement resolution was

50 pm/

25 pm. The experimental results showed that the planar grating displacement measurement system can measure the

and

direction displacement simultaneously， and the

direction motion stroke was ±1 mm， which met the vertical focusing requirements of the dual workpiece of the lithography machine. When the limit rotation angle of

uniaxial rotation or triaxial combined rotation was ± 1.5 mrad， the AC signal quality still met the measurement requirements. Moreover， it met the requirements of

leveling rotation of the dual workpiece table of lithography machine. To summarize， the displacement measurement system of the designed planar grating encoder met the corresponding measurement requirements of the photoengraving machine dual workpiece table and achieved higher performance indexes.

关键词

Keywords

references

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