Design on constant coherent light intensity fringe locking system for scanning beam interference lithography

Leijie WANG; Weiwen LUO; Ming ZHANG; Yu ZHU

doi:10.37188/OPE.20223008.0938

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Design on constant coherent light intensity fringe locking system for scanning beam interference lithography

Micro/Nano Technology and Fine Mechanics | 更新时间：2022-04-26

- Design on constant coherent light intensity fringe locking system for scanning beam interference lithography
- Optics and Precision Engineering Vol. 30, Issue 8, Pages: 938-947(2022)
- 作者机构：
  
  1.清华大学机械工程系摩擦学国家重点实验室&精密超精密制造装备及控制北京市重点实验室，北京 100084
  2.电子科技大学，四川成都 611731
- 作者简介：
- 基金信息：
- DOI：10.37188/OPE.20223008.0938
  CLC： TH741
- Received：25 August 2021，
  
  Revised：11 October 2021，
  
  Published：25 April 2022
- 稿件说明：
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王磊杰,罗伟文,张鸣等.恒光强扫描干涉光刻条纹锁定系统设计[J].光学精密工程,2022,30(08):938-947.

WANG Leijie,LUO Weiwen,ZHANG Ming,et al.Design on constant coherent light intensity fringe locking system for scanning beam interference lithography[J].Optics and Precision Engineering,2022,30(08):938-947.
王磊杰,罗伟文,张鸣等.恒光强扫描干涉光刻条纹锁定系统设计[J].光学精密工程,2022,30(08):938-947. DOI： 10.37188/OPE.20223008.0938.

WANG Leijie,LUO Weiwen,ZHANG Ming,et al.Design on constant coherent light intensity fringe locking system for scanning beam interference lithography[J].Optics and Precision Engineering,2022,30(08):938-947. DOI： 10.37188/OPE.20223008.0938.

摘要

为提高扫描干涉光刻机的加工效率和加工精度、扩大加工范围、降低维护成本，提出了一种可实现干涉条纹周期、方向和相位同步实时调节控制的扫描干涉光刻机系统方案，并着重介绍了最为关键的恒光强干涉条纹相位锁定系统的设计。首先，介绍了扫描干涉光刻中干涉条纹周期、方向和相位同步实时调节控制的扫描干涉光刻机系统原理方案，并设计实现了恒光强外差声光移频式干涉条纹相位锁定控制系统。然后，分析了控制系统理论模型，对系统实际模型进行辨识和高阶线性拟合，并设计了系统控制器。最后，在该控制器的基础上开展了调试和条纹锁定控制。实验结果显示，开启条纹锁定控制后，100 Hz以下的低频扰动成分受到明显抑制，干涉图形相位锁定的残余误差为0.069 3 rad（3

），即相位变化小于±0.01个干涉条纹周期；光束偏移调控误差达到100 μm时，干涉条纹锁定性能仍能保持稳定。该系统不仅可实现不同干涉姿态下干涉条纹的高精度锁定，还具有较大的光束调控误差裕度，满足干涉条纹周期、方向和相位同步实时控制的扫描干涉光刻机的需求。

Abstract

In order to improve the processing efficiency and processing accuracy of scanning beam interference lithography machines， expand their processing range， and reduce maintenance costs， a scanning beam interference lithography system is proposed， which can realize the synchronization and real-time adjustment and control of the interference fringe period， direction， and phase. Additionally， the design of the most critical constant coherent light intensity interference fringe phase locking system is emphatically introduced. First， the principle scheme of the scanning beam interference lithography tool with real-time adjustment and control of the interference fringe period， direction， and phase in lithography is introduced， and the constant coherent light intensity heterodyne acousto-optic frequency-shifted interference fringe phase locking control system is designed and implemented. Then， the theoretical model of the control system is analyzed， the actual model of the system is identified， high-order linear fitting is performed， and the system controller is designed. Finally， debugging and fringe lock control are performed on the basis of this controller. The experimental results show that after fringe locking control is turned on， low-frequency disturbance components below 100 Hz are significantly suppressed， and the residual error of the interference pattern phase locking is 0.0693 rad （3σ）； that is， the phase change is less than a factor of ±0.01 of the interference fringe period. Additionally， when the beam offset adjustment error reaches 100 μm， the interfering fringe lockability remains stable. The system can not only achieve high-precision locking of interference fringes under different interference attitudes， but it also has a large beam control error margin， which meets the needs of a scanning beam interference lithography machine with real-time control of the interference fringe period， direction， and phase.

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references

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