Grating X-ray collimator supported by Si<sub>3</sub>N<sub>4</sub> membrane with large aspect ratio written directly by electron beam

LI Yijie; XIAO Jun; CHEN Yifang; TONG Xujie; MU Chengyang

doi:10.37188/OPE.20223010.1181

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Grating X-ray collimator supported by Si₃N₄ membrane with large aspect ratio written directly by electron beam

Micro\/Nano Technology and Fine Mechanics | 更新时间：2026-09-11

- Grating X-ray collimator supported by Si₃N₄ membrane with large aspect ratio written directly by electron beam
- Optics and Precision Engineering Vol. 30, Issue 10, Pages: 1181-1188(2022)
- 作者机构：
  
  复旦大学信息科学与工程学院纳米光刻与应用科研组，上海 200433
- 作者简介：
- 基金信息：
- DOI：10.37188/OPE.20223010.1181
  CLC： O436.1
- Received：16 October 2021，
  
  Revised：2021-11-21，
  
  Published：25 May 2022
- 稿件说明：
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李艺杰,肖君,陈宜方等.电子束直写大深宽比Si₃N₄薄膜支撑的光栅X射线准直器[J].光学精密工程,2022,30(10):1181-1188. DOI: 10.37188/OPE.20223010.1181.

LI Yijie,XIAO Jun,CHEN Yifang,et al.Grating X-ray collimator supported by Si₃N₄ membrane with large aspect ratio written directly by electron beam[J].Optics and Precision Engineering,2022,30(10):1181-1188. DOI: 10.37188/OPE.20223010.1181.
李艺杰,肖君,陈宜方等.电子束直写大深宽比Si₃N₄薄膜支撑的光栅X射线准直器[J].光学精密工程,2022,30(10):1181-1188. DOI: 10.37188/OPE.20223010.1181. DOI：

LI Yijie,XIAO Jun,CHEN Yifang,et al.Grating X-ray collimator supported by Si₃N₄ membrane with large aspect ratio written directly by electron beam[J].Optics and Precision Engineering,2022,30(10):1181-1188. DOI: 10.37188/OPE.20223010.1181. DOI：

摘要

为了开发新的X射线准直器，利用电子束光刻（EBL）技术，结合电镀和湿法化学刻蚀工艺，在悬空的Si

隔膜上制作了大面积、高深宽比、微米周期的Au光栅。调整场拼接区域的曝光剂量解决了大面积的EBL光刻问题；用加强筋结构克服了制作高深宽比、高密度光刻胶模板时线条倒塌问题；通过在Si

隔膜下面保留很薄一层Si（25 nm 厚）和改善显影工艺，克服了厚光刻胶在300 nm 厚的Si

隔膜上显影时，光刻胶的断裂问题。实验结果显示，所制备的2 μm周期、深宽比为5.5，面积为400 μm×1 000 μm 的Au光栅可以对光子能量为8 keV的X射线进行调制。所制备的Au光栅狭缝可以用作线平行X射线断层成像系统的探测器准直器件，或面平行X射线断层成像系统的光源准直器件，提高系统的成像速度。

Abstract

The objective of this study was to develop a new X-ray collimator. Electron beam lithography （EBL） technology was coupled with electroplating and wet chemical etching technology to fabricate gold micron gratings involving a large area and high aspect ratio on a suspended silicon nitride membrane. The exposure dose in the field splicing area was adjusted to solve the large area EBL problem. The grating line collapse in high-aspect ratio and high-density photoresist templates was overcome by using a reinforced structure. The thick photoresist spin-coated fracture on the 300-nm Si

membrane was prevented by keeping an extremely thin layer of silicon （25 nm thick） under the thin Si

membrane； therefore， improving the development process. The results demonstrated that the gold gratings with a 2-μm period， 5.5 aspect ratio， and 400-μm by 1000-μm area can modulate the 8-keV energy X-rays. The fabricated gold gratings can be used as detector collimators in line-parallel X-ray tomography systems or as source collimators in area-parallel X-ray tomography systems to improve the imaging speed.

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references

MADI K ， STAINES K A ， BAY B K ， et al . In situ characterization of nanoscale strains in loaded whole joints via synchrotron X-ray tomography ［J］. Nature Biomedical Engineering ， 2020 ， 4 （ 3 ）： 343 - 354 . doi: 10.1038/s41551-019-0477-1 http://dx.doi.org/10.1038/s41551-019-0477-1

TAMASAKU K ， SHIGEMASA E ， INUBUSHI Y ， et al . X-ray two-photon absorption competing against single and sequential multiphoton processes ［J］. Nature Photonics ， 2014 ， 8 （ 4 ）： 313 - 316 . doi: 10.1038/nphoton.2014.10 http://dx.doi.org/10.1038/nphoton.2014.10

TAKEUCHI A ， UESUGI K ， SUZUKI Y . Three-dimensional phase-contrast X-ray microtomography with scanning-imaging X-ray microscope optics ［J］. Journal of Synchrotron Radiation ， 2013 ， 20 （ 5 ）： 793 - 800 . doi: 10.1107/s0909049513018876 http://dx.doi.org/10.1107/s0909049513018876

王琦，高党忠，马小军，等 . 惯性约束聚变靶丸高精度X射线数字成像［J］. 光学精密工程， 2020 ， 28 （ 2 ）： 324 - 333 .

WANG Q ， GAO D Z ， MA X J ， et al . High precision X-ray digital imaging of inertial confinement fusion capsules ［J］. Optics and Precision Engineering ， 2020 ， 28 （ 2 ）： 324 - 333 . （in Chinese）

谢红兰，邓彪，杜国浩，等 . 上海光源X射线成像及其在材料科学上的应用研究进展［J］. 失效分析与预防， 2021 ， 16 （ 1 ）： 46 - 59， 69 . doi: 10.3969/j.issn.1673-6214.2021.01.005 http://dx.doi.org/10.3969/j.issn.1673-6214.2021.01.005

XIE H L ， DENG B ， DU G H ， et al . Development of X-ray imaging methodology and its applications on material science at Shanghai synchrotron radiation facility ［J］. Failure Analysis and Prevention ， 2021 ， 16 （ 1 ）： 46 - 59， 69 . （in Chinese） . doi: 10.3969/j.issn.1673-6214.2021.01.005 http://dx.doi.org/10.3969/j.issn.1673-6214.2021.01.005

HARDING G . X-ray diffraction imaging—A multi-generational perspective ［J］. Applied Radiation and Isotopes ， 2009 ， 67 （ 2 ）： 287 - 295 . doi: 10.1016/j.apradiso.2008.08.006 http://dx.doi.org/10.1016/j.apradiso.2008.08.006

HIRAGA J S ， NAKAMURA S ， UCHIDA Y ， et al . A novel multi-collimator using BP-1 glass and an application for X-ray CCDs ［J］. Nuclear Instruments and Methods in Physics Research Section A： Accelerators， Spectrometers， Detectors and Associated Equipment ， 2007 ， 573 （ 1/2 ）： 236 - 239 . doi: 10.1016/j.nima.2006.10.391 http://dx.doi.org/10.1016/j.nima.2006.10.391

HAO Z R ， FAN G T ， WANG H W ， et al . Collimator system of SLEGS beamline at Shanghai light source ［J］. Nuclear Instruments and Methods in Physics Research Section A： Accelerators， Spectrometers， Detectors and Associated Equipment ， 2021 ， 1013 ： 165638 . doi: 10.1016/j.nima.2021.165638 http://dx.doi.org/10.1016/j.nima.2021.165638

MARASHDEH M W . Effect of the LEGe detector collimators on K-series peaks and Compton scattering in XRF analysis using gamma rays ［J］. Heliyon ， 2018 ， 4 （ 8 ）： e00724 . doi: 10.1016/j.heliyon.2018.e00724 http://dx.doi.org/10.1016/j.heliyon.2018.e00724

HOSSEIN M ， REZA S M ， JAMSHID S N . Image quality and dose assessment of collimator slit width effect in SLOT-SCAN X-ray imaging system ［J］. Applied Radiation and Isotopes ， 2021 ， 171 ： 109642 . doi: 10.1016/j.apradiso.2021.109642 http://dx.doi.org/10.1016/j.apradiso.2021.109642

NIKULIN A Y ， DAVIS J R . Refraction phenomena in X-ray scattering experiments performed with a narrow collimator aperture ［J］. Optics Communications ， 1998 ， 155 （ 4/5/6 ）： 231 - 235 . doi: 10.1016/s0030-4018(98)00375-7 http://dx.doi.org/10.1016/s0030-4018(98)00375-7

TSUJI K ， MATSUDA A ， NAKANO K ， et al . X-ray fluorescence analysis of soft materials using needle-type collimators enabling greater tolerance in analysis depth ［J］. Spectrochimica Acta Part B： Atomic Spectroscopy ， 2006 ， 61 （ 4 ）： 460 - 464 . doi: 10.1016/j.sab.2006.01.014 http://dx.doi.org/10.1016/j.sab.2006.01.014

SIDAMBE A T ， JUDSON D S ， COLOSIMO S J ， et al . Laser Powder bed fusion of a pure tungsten ultra-fine single pinhole collimator for use in gamma ray detector characterisation ［J］. International Journal of Refractory Metals and Hard Materials ， 2019 ， 84 ： 104998 . doi: 10.1016/j.ijrmhm.2019.104998 http://dx.doi.org/10.1016/j.ijrmhm.2019.104998

LIEBER A ， BENJAMIN R ， LYONS P ， et al . Micro-channel plate as a parallel-bore collimator for soft X-ray imaging ［J］. Nuclear Instruments and Methods ， 1975 ， 125 （ 4 ）： 553 - 556 . doi: 10.1016/0029-554x(75)90472-3 http://dx.doi.org/10.1016/0029-554x(75)90472-3

郑春晓，蔡明生，胡一鸣，等 . 硬X射线成像望远镜系统初步研究［J］. 天文学报， 2014 ， 55 （ 2 ）： 154 - 169 . doi: 10.3969/j.issn.0001-5245.2014.02.006 http://dx.doi.org/10.3969/j.issn.0001-5245.2014.02.006

ZHENG C X ， CAI M S ， HU Y M ， et al . A preliminary research on the development of the hard X-ray imaging telescope ［J］. Acta Astronomica Sinica ， 2014 ， 55 （ 2 ）： 154 - 169 . （in Chinese） . doi: 10.3969/j.issn.0001-5245.2014.02.006 http://dx.doi.org/10.3969/j.issn.0001-5245.2014.02.006

LI F Z ， LIU Z G ， SUN T X . Energy-dispersive small-angle X-ray scattering with cone collimation using X-ray capillary optics ［J］. The Review of Scientific Instruments ， 2016 ， 87 （ 9 ）： 093106 . doi: 10.1063/1.4962709 http://dx.doi.org/10.1063/1.4962709

HAMPAI D ， GUGLIELMOTTI V ， MARCELLI A ， et al . Shaped X-ray beams by channeling in polycapillary optics ［J］. Radiation Physics and Chemistry ， 2020 ， 174 ： 108965 . doi: 10.1016/j.radphyschem.2020.108965 http://dx.doi.org/10.1016/j.radphyschem.2020.108965

KHONG J C ， SPELLER R ， DORKINGS S ， et al . Rapid prototyping of cost efficient X-ray collimators ［J］. Manufacturing Letters ， 2019 ， 20 ： 49 - 53 . doi: 10.1016/j.mfglet.2019.05.001 http://dx.doi.org/10.1016/j.mfglet.2019.05.001

DABAGOV S B ， UBERALL H . On X-ray channeling in narrow guides ［J］. Nuclear Instruments and Methods in Physics Research Section B： Beam Interactions With Materials and Atoms ， 2008 ， 266 （ 17 ）： 3881 - 3887 . doi: 10.1016/j.nimb.2008.03.238 http://dx.doi.org/10.1016/j.nimb.2008.03.238

王建英，邹晶，陈津平，等 . 基于毛细管的X射线显微成像系统可行性［J］. 纳米技术与精密工程， 2017 ， 15 （ 6 ）： 507 - 512 . doi: 10.13494/j.npe.20160112 http://dx.doi.org/10.13494/j.npe.20160112

WANG J Y ， ZOU J ， CHEN J P ， et al . Feasibility of X-ray microscope imaging system based on polycapillary ［J］. Nanotechnology and Precision Engineering ， 2017 ， 15 （ 6 ）： 507 - 512 . （in Chinese） . doi: 10.13494/j.npe.20160112 http://dx.doi.org/10.13494/j.npe.20160112

周洪军，钟鹏飞，郑津津，等 . 不同厚度Al滤片对17~33nm高次谐波抑制的定量研究［J］. 光学精密工程， 2007 ， 15 （ 7 ）： 1016 - 1020 . doi: 10.3321/j.issn:1004-924X.2007.07.004 http://dx.doi.org/10.3321/j.issn:1004-924X.2007.07.004

ZHOU H J ， ZHONG P F ， ZHENG J J ， et al . Quantitative research on higher order harmonic suppression in 17 3 3 nm with different thickness Al filters ［J］. Optics and Precision Engineering ， 2007 ， 15 （ 7 ）： 1016 - 1020 . （in Chinese） . doi: 10.3321/j.issn:1004-924X.2007.07.004 http://dx.doi.org/10.3321/j.issn:1004-924X.2007.07.004

陈田祥，高娜，李琳，等 . 空间X射线探测用遮光膜的光学性能表征［J］. 光学精密工程， 2019 ， 27 （ 11 ）： 2337 - 2342 . doi: 10.3788/ope.20192711.2337 http://dx.doi.org/10.3788/ope.20192711.2337

CHEN T X ， GAO N ， LI L ， et al . Optical property characterization of optical blocking filters used in space X-ray survey ［J］. Optics and Precision Engineering ， 2019 ， 27 （ 11 ）： 2337 - 2342 . （in Chinese） . doi: 10.3788/ope.20192711.2337 http://dx.doi.org/10.3788/ope.20192711.2337

PREM P ， VEERLA S ， NARASIMHA R A V ， et al . High speed silicon wet anisotropic etching for applications in bulk micromachining： a review ［J］. Micro and Nano Systems Letters ， 2021 ， 9 （ 1 ）： 1 - 59 . doi: 10.1186/s40486-021-00129-0 http://dx.doi.org/10.1186/s40486-021-00129-0

LI Y J ， CHEN Y F ， WANG H C ， et al . A novel and reliable approach for controlling silicon membrane thickness with smooth surface ［J］. Microelectronic Engineering ， 2022 ， 251 ： 111640 . doi: 10.1016/j.mee.2021.111640 http://dx.doi.org/10.1016/j.mee.2021.111640

DOBISZ E A . Reduction and elimination of proximity effects ［J］. Journal of Vacuum Science & Technology B： Microelectronics and Nanometer Structures ， 1993 ， 11 （ 6 ）： 2733 . doi: 10.1116/1.586593 http://dx.doi.org/10.1116/1.586593

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Grating X-ray collimator supported by Si3N4 membrane with large aspect ratio written directly by electron beam

DOI：10.37188/OPE.20223010.1181

摘要

Abstract

关键词

Keywords

references

Grating X-ray collimator supported by Si₃N₄ membrane with large aspect ratio written directly by electron beam