Modeling and experimental study on material removal rate of quartz wafer by fixed abrasive lapping

JIA Yufan; ZHU Xianglong; YANG Lei; KANG Renke; DONG Zhigang

doi:10.37188/OPE.20233116.2362

您当前的位置：

首页 >

文章列表页 >

Modeling and experimental study on material removal rate of quartz wafer by fixed abrasive lapping

Micro\/Nano Technology and Fine Mechanics | 更新时间：2026-09-11

- Modeling and experimental study on material removal rate of quartz wafer by fixed abrasive lapping
- Optics and Precision Engineering Vol. 31, Issue 16, Pages: 2362-2371(2023)
- 作者机构：
  
  大连理工大学高性能精密制造全国重点实验室，辽宁大连 116024
- 作者简介：
  
  E-mail： kangrk@dlut.edu.cn
- 基金信息：
- DOI：10.37188/OPE.20233116.2362
  CLC： TH161+.1;TG73
- Received：08 March 2023，
  
  Revised：2023-04-08，
  
  Published：25 August 2023
- 稿件说明：
移动端阅览
贾玙璠,朱祥龙,杨垒等.固结磨料研磨石英晶片材料去除率建模与试验研究[J].光学精密工程,2023,31(16):2362-2371.

JIA Yufan,ZHU Xianglong,YANG Lei,et al.Modeling and experimental study on material removal rate of quartz wafer by fixed abrasive lapping[J].Optics and Precision Engineering,2023,31(16):2362-2371.
贾玙璠,朱祥龙,杨垒等.固结磨料研磨石英晶片材料去除率建模与试验研究[J].光学精密工程,2023,31(16):2362-2371. DOI： 10.37188/OPE.20233116.2362.

JIA Yufan,ZHU Xianglong,YANG Lei,et al.Modeling and experimental study on material removal rate of quartz wafer by fixed abrasive lapping[J].Optics and Precision Engineering,2023,31(16):2362-2371. DOI： 10.37188/OPE.20233116.2362.

摘要

针对固结磨料研磨石英晶片材料去除率难以预测的问题，提出一种基于接触力学和广义回归神经网络（GRNN）的石英晶片材料去除率模型。首先根据脆/塑材料去除机理、磨粒块与晶片微观接触简化形式，采用微积分、力平衡原理等方法，建立了理想情况下的材料去除率模型。然后采用微单元法，进行了三因素四水平正交试验，并通过GRNN分析研磨液流量、研磨液浓度、研磨盘转速与材料去除率修正系数的映射关系，进一步完善了材料去除率模型。最后为验证材料去除率模型，设定研磨盘转速为20 r/min，研磨液浓度为5

.%，研磨液流量为36 ml/min，仿真并测量不同研磨压强以及相对速度下，晶片材料去除率预测值与实际值。结果表明：研磨压强和相对速度的增加使晶片材料去除加快，材料去除率模型预测值与实际值变化趋势相同，模型误差为8.57%。材料去除率模型基本满足固结磨料研磨工艺中石英晶片材料去除率预测需求。

Abstract

The material removal rate of a quartz wafer by fixed abrasive lapping is difficult to predict； therefore， a model of the material removal rate based on contact mechanics and a generalized regression neural network （GRNN） is proposed. First， according to the ductile–brittle material removal mechanism and the simplified form of micro-contact between the abrasive block and wafer， an ideal material removal rate model was established by using calculus and the force balance principle. Then， a three-factor four-level orthogonal test was performed using the microelement method. The mapping relationship of the lapping fluid flow， lapping fluid concentration， lapping disk speed， and material removal rate correction coefficient was analyzed using the GRNN. The material removal rate model was further improved. Finally， to validate the material removal rate model， a lapping experiment was conducted. The lapping disk speed was set to 20 r/min， lapping fluid concentration to 5 wt.%， and lapping fluid flow rate to 36 ml/min. The predicted and actual values of the wafer material removal rate were simulated and measured under different lapping pressures and relative velocities. It was found that the increase in lapping pressure and relative velocity accelerates the removal of the wafer material. The predicted value of the material removal rate model exhibited the same trend as the actual value， and the error of model was 8.57%. The material removal rate model meets the demand for predicting the material removal rate of quartz wafers in fixed abrasive lapping.

关键词

Keywords

references

MUROZAKI Y ， SAKUMA S ， ARAI F ， et al . Improvement of the measurement range and temperature characteristics of a load sensor using a quartz crystal resonator with all crystal layer components ［J］. Sensors ， 2017 ， 17 （ 5 ）： 1067 . doi: 10.3390/s17051067 http://dx.doi.org/10.3390/s17051067

LV B H ， YUAN J L ， YAO Y X ， et al . Study on fixed abrasive lapping technology for ceramic balls ［J］. Materials Science Forum ， 2006 ， 532/533 ： 460 - 463 . doi: 10.4028/www.scientific.net/msf.532-533.460 http://dx.doi.org/10.4028/www.scientific.net/msf.532-533.460

WANG X ， ZHANG X J . Theoretical study on removal rate and surface roughness in grinding a RB-SiC mirror with a fixed abrasive ［J］. Applied Optics ， 2009 ， 48 （ 5 ）： 904 . doi: 10.1364/ao.48.000904 http://dx.doi.org/10.1364/ao.48.000904

DONG Z ， CHENG H . Study on removal mechanism and removal characters for SiC and fused silica by fixed abrasive diamond pellets ［J］. International Journal of Machine Tools and Manufacture ， 2014 ， 85 ： 1 - 13 . doi: 10.1016/j.ijmachtools.2014.04.008 http://dx.doi.org/10.1016/j.ijmachtools.2014.04.008

REN L L ， ZHANG F H ， ZHAO S J ， et al . Correlation between polishing pad’s properties and material removal during full-aperture polishing ［J］. International Journal of Applied Glass Science ， 2019 ， 10 （ 3 ）： 287 - 301 . doi: 10.1111/ijag.13178 http://dx.doi.org/10.1111/ijag.13178

林彬，李凯隆，曹中臣，等 . 固结磨料确定性研磨表面生成建模与实验分析［J］. 天津大学学报， 2019 ， 52 （ 9 ）： 917 - 931 .

LIN B ， LI K L ， CAO Z C ， et al . Surface generation modeling and experimental analysis of the fixed abrasive deterministic lapping process ［J］. Journal of Tianjin University ， 2019 ， 52 （ 9 ）： 917 - 931 . （in Chinese）

ZHANKUI W ， MINGHUA P ， MINGCHAO L ， et al . Effect of material structure on spinel machinability in its fixed abrasive lapping ［J］. Journal of Manufacturing Processes ， 2021 ， 68 ： 141 - 153 . doi: 10.1016/j.jmapro.2021.05.035 http://dx.doi.org/10.1016/j.jmapro.2021.05.035

BIN L ， JUNPENG Z ， ZHONG-CHEN C ， et al . Theoretical and experimental investigation on surface generation and subsurface damage in fixed abrasive lapping of optical glass ［J］. International Journal of Mechanical Sciences ， 2022 ， 215 ： 106941 . doi: 10.1016/j.ijmecsci.2021.106941 http://dx.doi.org/10.1016/j.ijmecsci.2021.106941

刘德福，段吉安 . 光纤端面研磨加工机理研究［J］. 光学精密工程， 2004 ， 12 （ 6 ）： 570 - 575 . doi: 10.3321/j.issn:1004-924X.2004.06.004 http://dx.doi.org/10.3321/j.issn:1004-924X.2004.06.004

LIU D F ， DUAN J . Mechanism research on lapping of optical fiber end-face ［J］. Opt. Precision Eng. ， 2004 ， 12 （ 6 ）： 570 - 575 . （in Chinese） . doi: 10.3321/j.issn:1004-924X.2004.06.004 http://dx.doi.org/10.3321/j.issn:1004-924X.2004.06.004

王占奎，杨亚坤，逄明华，等 . 石英玻璃固结磨料研磨工艺参数响应面模型的研究［J］. 表面技术， 2021 ， 50 （ 7 ）： 376 - 385 . doi: 10.16490/j.cnki.issn.1001-3660.2021.07.040 http://dx.doi.org/10.16490/j.cnki.issn.1001-3660.2021.07.040

WANG Z K ， YANG Y K ， PANG M H ， et al . Response surface model of processing parameters for lapping quartz glass with a fixed abrasive pad ［J］. Surface Technology ， 2021 ， 50 （ 7 ）： 376 - 385 . （in Chinese） . doi: 10.16490/j.cnki.issn.1001-3660.2021.07.040 http://dx.doi.org/10.16490/j.cnki.issn.1001-3660.2021.07.040

黄传锦，周海，朱永伟，等 . 研磨液在氧化镓晶体研磨中的作用［J］. 硅酸盐学报， 2019 ， 47 （ 1 ）： 43 - 47 .

HUANG C J ， ZHOU H ， ZHU Y W ， et al . Effect of lapping fluid on β-Ga 2 O 3 crystal lapping process ［J］. Journal of the Chinese Ceramic Society ， 2019 ， 47 （ 1 ）： 43 - 47 . （in Chinese）

李军，夏磊，王晓明，等 . 三乙醇胺浓度对固结磨料研磨垫自锐性能的影响［J］. 光学精密工程， 2014 ， 22 （ 12 ）： 3287 - 3293 . doi: 10.3788/ope.20142212.3287 http://dx.doi.org/10.3788/ope.20142212.3287

LI J ， XIA L ， WANG X M ， et al . Effect of triethanolamine concentration on self-sharpening performance of fixed abrasive pad ［J］. Opt. Precision Eng. ， 2014 ， 22 （ 12 ）： 3287 - 3293 . （in Chinese） . doi: 10.3788/ope.20142212.3287 http://dx.doi.org/10.3788/ope.20142212.3287

LAWN B R ， EVANS A G . A model for crack initiation in elastic/plastic indentation fields ［J］. Journal of Materials Science ， 1977 ， 12 （ 11 ）： 2195 - 2199 . doi: 10.1007/bf00552240 http://dx.doi.org/10.1007/bf00552240

LAMBROPOULOS J C ， JACOBS S D ， RUCKMAN J . Material removal mechanisms from grinding to polishing ［J］. Ceram. Trans. ， 1999 ， 102 ： 113 - 128 . doi: 10.1364/oft.1998.omb.1 http://dx.doi.org/10.1364/oft.1998.omb.1

LAWN B ， WILSHAW R . Indentation fracture： principles and applications ［J］. Journal of Materials Science ， 1975 ， 10 （ 6 ）： 1049 - 1081 . doi: 10.1007/bf00823224 http://dx.doi.org/10.1007/bf00823224

王旭，张学军 . 固着磨料加工碳化硅反射镜的微观理论模型［J］. 光学精密工程， 2009 ， 17 （ 3 ）： 513 - 518 . doi: 10.3321/j.issn:1004-924X.2009.03.008 http://dx.doi.org/10.3321/j.issn:1004-924X.2009.03.008

WANG X ， ZHANG X J . Micro theoretical model for grinding SiC mirror with fixed abrasive ［J］. Opt. Precision Eng. ， 2009 ， 17 （ 3 ）： 513 - 518 . （in Chinese） . doi: 10.3321/j.issn:1004-924X.2009.03.008 http://dx.doi.org/10.3321/j.issn:1004-924X.2009.03.008

LEE T ， KIM H ， LEE S ， et al . Self-dressing effect using a fixed abrasive platen for single-sided lapping of sapphire substrate ［J］. Journal of Mechanical Science and Technology ， 2017 ， 31 （ 12 ）： 5649 - 5655 . doi: 10.1007/s12206-017-1105-1 http://dx.doi.org/10.1007/s12206-017-1105-1

王子琨，朱永伟，金振弘，等 . 乙醇浓度对亲水性固结磨料垫自修整特性的影响［J］. 光学精密工程， 2018 ， 26 （ 4 ）： 843 - 849 . doi: 10.3788/ope.20182604.0843 http://dx.doi.org/10.3788/ope.20182604.0843

WANG Z K ， ZHU Y W ， JIN Z H ， et al . Effect of ethanol solution on self-condition property of hydrophilic fixed abrasive pad ［J］. Opt. Precision Eng. ， 2018 ， 26 （ 4 ）： 843 - 849 . （in Chinese） . doi: 10.3788/ope.20182604.0843 http://dx.doi.org/10.3788/ope.20182604.0843

高向东，周晓虎，李彦峰，等 . 磁光成像漏磁特征在焊接缺陷轮廓重构中的应用［J］. 光学精密工程， 2019 ， 27 （ 8 ）： 1863 - 1869 . doi: 10.3788/ope.20192708.1863 http://dx.doi.org/10.3788/ope.20192708.1863

GAO X D ， ZHOU X H ， LI Y F ， et al . Application of magneto-optical imaging magnetic flux leakage characteristics in contour reconstruction of welding defects ［J］. Opt. Precision Eng. ， 2019 ， 27 （ 8 ）： 1863 - 1869 . （in Chinese） . doi: 10.3788/ope.20192708.1863 http://dx.doi.org/10.3788/ope.20192708.1863

Views

404

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

OPE Cover | Modeling and experimental study on material removal rate of consolidated abrasive grinding quartz wafer

Study on magnetorheological polishing method for K9 glass utilizing Halbach array

Experimental study on performance stability and service life of magnetic compound fluid

Double-sided lapping uniformity of LiTaO3 based on three-dimensional trajectory of particles

Influence of water in magnetic compound fluid on polishing performance

Magnetic-assisted polishing of fused silica optics with high efficiency and low defects

Related Author

CHEN Zhenxian

GUO Lei

LIU Jin

JIN Qichao

YUAN Xiao

LU Shunli

LÜ Lei

ZHONG Taiyang

Related Institution

General Technology Group Machine Tool Engineering Research Institute

State Key Laboratory For Manufacturing System Engineering，Xi'an Jiaotong University

MOE Key Laboratory of Road Construction Technology and Equipment， Chang'an University

Department of Mechanical and Energy Engineering， Southern University of Science and Technology

State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals， Lanzhou University of Technology

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China Postal code：130033
Tel：0431-86176855 Email：gxjmgc@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰