Thin-layer control error analysis and performance optimization of visible light anti-reflection film

FU Xiuhua; WEI Yujun; LIN Zhaowen; PAN Yonggang; LI Gang; FU Guangyuan

doi:10.37188/OPE.20243201.0001

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Thin-layer control error analysis and performance optimization of visible light anti-reflection film

Modern Applied Optics | 更新时间：2024-01-13

- Thin-layer control error analysis and performance optimization of visible light anti-reflection film
- Optics and Precision Engineering Vol. 32, Issue 1, Pages: 1-11(2024)
- 作者机构：
  
  1.长春理工大学光电工程学院，吉林长春 130022
  2.长春理工大学中山研究院，广东中山 528436
  3.中山吉联光电科技有限公司，广东中山 528436
  4.云南北方光学科技有限公司，云南昆明 650216
- 作者简介：
- 基金信息：
- DOI：10.37188/OPE.20243201.0001
  CLC： O484
- Published：10 January 2024，
  
  Received：22 August 2023，
  
  Revised：11 September 2023，
- 稿件说明：
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付秀华,魏雨君,林兆文等.可见光减反射膜薄层控制误差的分析与性能优化[J].光学精密工程,2024,32(01):1-11.

FU Xiuhua,WEI Yujun,LIN Zhaowen,et al.Thin-layer control error analysis and performance optimization of visible light anti-reflection film[J].Optics and Precision Engineering,2024,32(01):1-11.
付秀华,魏雨君,林兆文等.可见光减反射膜薄层控制误差的分析与性能优化[J].光学精密工程,2024,32(01):1-11. DOI： 10.37188/OPE.20243201.0001.

FU Xiuhua,WEI Yujun,LIN Zhaowen,et al.Thin-layer control error analysis and performance optimization of visible light anti-reflection film[J].Optics and Precision Engineering,2024,32(01):1-11. DOI： 10.37188/OPE.20243201.0001.

摘要

为提升光学镜头的成像质量，消除杂散光的影响，以K9玻璃为基底设计可见光波段平均反射率小于0.1%的减反射膜。采用电子束离子辅助沉积的制备方式，针对薄层敏感度高、光谱变化大等问题，通过建立稳定控制膜层厚度的数学模型来减小膜厚误差，提高制备精度和成膜稳定性。对减反射膜进行环测实验，优化调整工艺参数，侧重提高减反射膜的硬度和耐水煮能力。实验结果表明，最终制备出的减反射膜在420~680 nm波段内的平均反射率约为0.044%，最高反射率为0.071 2%，克服了以MgF

为外层的减反射膜机械性能和化学稳定性较差的问题，满足工程应用低损耗、稳定可靠、高强度、可重复性制备的要求。

Abstract

To improve the imaging quality of optical lenses and eliminate the influence of stray light， an antireflective film with an average reflectance of less than 0.1% in the visible wavelength range was designed on a K9 glass substrate. Using electron beam evaporation as the preparation method， to address the issues of high sensitivity and large spectral changes in thin films， a mathematical model was established to stabilize the control of film thickness， reduce film thickness errors， improve preparation accuracy， and film formation stability. Environmental testing experiments were conducted on the antireflective film， in which the process parameters were continuously optimized and adjusted， with a focus on improving the hardness and water boiling resistance of the antireflective film. The experimental results show that the average reflectance of the prepared antireflective film is approximately 0.044% and the highest reflectance is 0.071 2% in the band range of 420-680 nm. Thus， problems caused by the poor mechanical properties and chemical stability of the antireflective film with MgF

as the outer layer are overcome. Further， the developed film meets the requirements of low loss， stability， reliability， high strength， and repeatable preparation in engineering applications.

关键词

光学薄膜电子束蒸发镀膜误差控制机械性能可见光反射率

Keywords

thin filmelectron beam evaporation coatingerror controlmechanical propertiesvisible lightreflectance

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