Micron-level processing technology of microlens array (MLA) photolithography based on convolutional neural network
Micro/Nano Technology and Fine Mechanics|更新时间:2024-01-13
|
Micron-level processing technology of microlens array (MLA) photolithography based on convolutional neural network
“In the MLA exposure process, a circular pattern is designed and the Yolov5 model is introduced to quickly determine the exposure quality, analyze parameters such as photoresist thickness and line energy density, and provide a basis for process optimization.”
Optics and Precision EngineeringVol. 32, Issue 1, Pages: 43-52(2024)
YAO Yuchao,ZHOU Rui,YAN Xing,et al.Micron-level processing technology of microlens array (MLA) photolithography based on convolutional neural network[J].Optics and Precision Engineering,2024,32(01):43-52.
YAO Yuchao,ZHOU Rui,YAN Xing,et al.Micron-level processing technology of microlens array (MLA) photolithography based on convolutional neural network[J].Optics and Precision Engineering,2024,32(01):43-52. DOI: 10.37188/OPE.20243201.0043.
Micron-level processing technology of microlens array (MLA) photolithography based on convolutional neural network