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Micron-level processing technology of microlens array (MLA) photolithography based on convolutional neural network
Micro/Nano Technology and Fine Mechanics | 更新时间:2024-01-13
    • Micron-level processing technology of microlens array (MLA) photolithography based on convolutional neural network

    • In the MLA exposure process, a circular pattern is designed and the Yolov5 model is introduced to quickly determine the exposure quality, analyze parameters such as photoresist thickness and line energy density, and provide a basis for process optimization.
    • Optics and Precision Engineering   Vol. 32, Issue 1, Pages: 43-52(2024)
    • DOI:10.37188/OPE.20243201.0043    

      CLC: TN248;TH391.41
    • Received:15 August 2023

      Revised:11 September 2023

      Published:10 January 2024

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  • YAO Yuchao,ZHOU Rui,YAN Xing,et al.Micron-level processing technology of microlens array (MLA) photolithography based on convolutional neural network[J].Optics and Precision Engineering,2024,32(01):43-52. DOI: 10.37188/OPE.20243201.0043.

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