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Micron-level processing technology of microlens array （MLA） photolithography based on convolutional neural network
Micro/Nano Technology and Fine Mechanics | 更新时间：2024-01-13
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    • Micron-level processing technology of microlens array （MLA） photolithography based on convolutional neural network

    • “In the MLA exposure process, a circular pattern is designed and the Yolov5 model is introduced to quickly determine the exposure quality, analyze parameters such as photoresist thickness and line energy density, and provide a basis for process optimization.”
    • Optics and Precision Engineering   Vol. 32, Issue 1, Pages: 43-52(2024)

    • DOI：10.37188/OPE.20243201.0043    

      CLC： TN248;TH391.41

    • Received：15 August 2023，

      Revised：11 September 2023，

      Published：10 January 2024

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  • YAO Yuchao,ZHOU Rui,YAN Xing,et al.Micron-level processing technology of microlens array （MLA） photolithography based on convolutional neural network[J].Optics and Precision Engineering,2024,32(01):43-52. DOI： 10.37188/OPE.20243201.0043.

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