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High-precision laser confocal measurement of semiconductor wafer thickness
Modern Applied Optics | 更新时间：2026-09-11

    • High-precision laser confocal measurement of semiconductor wafer thickness

    • Optics and Precision Engineering   Vol. 32, Issue 7, Pages: 956-965(2024)

    • DOI：10.37188/OPE.20243207.0956    

      CLC： TN307;TH741

    • Received：13 November 2023，

      Revised：2023-11-30，

      Published：10 April 2024

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  • LI Zhaoyu,LIU Zihao,WANG Yaoying,et al.High-precision laser confocal measurement of semiconductor wafer thickness[J].Optics and Precision Engineering,2024,32(07):956-965.

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