您当前的位置:
首页 >
文章列表页 >
Research developments of extreme ultra-violet multilayers for 40-90 nm
Modern Applied Optics | 更新时间:2026-09-11
    • Research developments of extreme ultra-violet multilayers for 40-90 nm

    • Optics and Precision Engineering   Vol. 32, Issue 9, Pages: 1293-1306(2024)
    • DOI:10.37188/OPE.20243209.1293    

      CLC: TN405;TN23
    • Received:17 April 2024,

      Revised:2024-04-30,

      Published:10 May 2024

    移动端阅览

  • LAI Bo,JIANG Li,Qi Runze,et al.Research developments of extreme ultra-violet multilayers for 40-90 nm[J].Optics and Precision Engineering,2024,32(09):1293-1306.

  •  
  •  

0

Views

743

下载量

1

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

Development of collimated focus coupled optical path for film thickness monitoring system
Research progress of normal-incidence optical system at extreme ultraviolet (EUV) wavelength
Research progress of multilayer X-ray imaging optics for plasma diagnostics
Design and manufacture on multilayers of low-Z materials at 14 nm
Influence of Different Base Pressure on SiC/Mg EUV Multilayer Mirror’s Performance

Related Author

WANG Youde
DU Xin
SHI Peng
DONG Suotao
FU Xiuhua
XIE Haifeng
REN Songlin
YI Shengzhen

Related Institution

Zhongshan Torch Polytechnic
Zhongshan Institute of Changchun University of Science and Technology
Guangdong Changli Jingxun Optoelectronics Technology Co
College of Optoelectronic Engineering, Changchun University of Science and Technology, Chang chun
Institute of Precision Optical Engineering, MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai Frontiers Science Center of Digital Optics, Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, School of Physics Science and Engineering, Tongji University
0