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Research developments of extreme ultra-violet multilayers for 40-90 nm
Modern Applied Optics | 更新时间：2024-05-18

    • Research developments of extreme ultra-violet multilayers for 40-90 nm

    • “Technology news broadcast: Extreme ultraviolet multilayer mirrors play a key role in multiple scientific and technological fields such as photolithography and astrophysics. Experts conducted in-depth research on multilayer films in the 40-90nm wavelength range, explored the optimal reflectivity and bandwidth of Mg based, Sc based and other materials, verified the time stability of multilayer films, provided technical guidance for multilayer film preparation, and provided strong support for related scientific research and applications.”
    • Optics and Precision Engineering   Vol. 32, Issue 9, Pages: 1293-1306(2024)

    • DOI：10.37188/OPE.20243209.1293    

      CLC： TN405;TN23

    • Received：17 April 2024，

      Revised：30 April 2024，

      Published：10 May 2024

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  • LAI Bo,JIANG Li,Qi Runze,et al.Research developments of extreme ultra-violet multilayers for 40-90 nm[J].Optics and Precision Engineering,2024,32(09):1293-1306. DOI： 10.37188/OPE.20243209.1293.

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Related Author

WANG Youde
DU Xin
SHI Peng
DONG Suotao
FU Xiuhua
XIE Haifeng
REN Songlin
YI Shengzhen

Related Institution

Zhongshan Torch Polytechnic
Zhongshan Institute of Changchun University of Science and Technology
Guangdong Changli Jingxun Optoelectronics Technology Co
College of Optoelectronic Engineering， Changchun University of Science and Technology， Chang chun
Institute of Precision Optical Engineering， MOE Key Laboratory of Advanced Micro-Structured Materials， Shanghai Frontiers Science Center of Digital Optics， Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications， School of Physics Science and Engineering， Tongji University
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