“In the field of multi beam electron exposure systems, researchers have designed and fabricated a 3 × 3 micro array beam shutter, successfully achieving fast on/off control of the electron beam. The deflection speed and functional integrity of the controller were verified through optimized design and MEMS process preparation. The experimental results show that the deflection speed of the array beam gate controller reaches 43.5 MHz, the electron beam deflection distance is between 25-30 μ m, and the crosstalk is less than 3%. This study provides an important foundation for improving the accuracy and efficiency of multi beam electron beam exposure.”