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Preparation of Ni microneedle array using thin photoresist microelectroforming technique
Micro/Nano Technology and Fine Mechanics | 更新时间：2024-09-27

    • Preparation of Ni microneedle array using thin photoresist microelectroforming technique

    • “In the field of bioengineering, researchers have proposed a new thin gel microelectroforming process, successfully preparing array nickel microneedles with a tip curvature radius of nanometer scale, laying the foundation for the mass production of array nickel microneedles.”
    • Optics and Precision Engineering   Vol. 32, Issue 16, Pages: 2492-2503(2024)

    • DOI：10.37188/OPE.20243216.2492    

      CLC： TN205;TN305.7

    • Received：05 February 2024，

      Revised：15 March 2024，

      Published：25 August 2024

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  • WANG Huaan,LI Xiaojian,YIN Penghe,et al.Preparation of Ni microneedle array using thin photoresist microelectroforming technique[J].Optics and Precision Engineering,2024,32(16):2492-2503. DOI： 10.37188/OPE.20243216.2492.

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