WEI Zheng-ying, XIONG Xiao-dong, DU Jun, DING Yu-cheng. Flow behavior of resist in room-temperature micro-imprinting and its process optimization[J]. 光学精密工程, 2010,18(8): 1822-1832
WEI Zheng-ying, XIONG Xiao-dong, DU Jun, DING Yu-cheng. Flow behavior of resist in room-temperature micro-imprinting and its process optimization[J]. 光学精密工程, 2010,18(8): 1822-1832 DOI: 10.3788/OPE.20101808.1822.
Flow behavior of resist in room-temperature micro-imprinting and its process optimization
To improve the replicating precision of resist in micro-imprinting
the POLYFLOW was used to simulate its flow behavior in room-temperature micro-imprinting based on the Fluid-Solid-Interaction(FSI) method.The effects of the initial thickness and residual thickness of the resist
the ratio of height to width and duty ratio of the mold
and the imprinting velocity of the mold on the resist flow behavior in a cavity were analyzed systematically. A platform of visual experiments was established
and the process of micro-imprinting and the profile of resist in different technological conditions were observed. Comparing the experimental results to the simulation results
it is concluded that the filling rate can come up to 90% when the imprinting velocity is slower than 1 m/s
the duty ratio is more than 0.375
and the ratio of height to width is less than 2. Obtained results show that the imprinting process condition and the structure of the mold have been optimized and the replicating precision can be improved by the optimized results.
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