Application of multi-mode combined polishing to optical manufacturing

XUAN Bin; XIE Jing-jiang; SONG Shu-mei

doi:10.3788/OPE.20111901.0041

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Application of multi-mode combined polishing to optical manufacturing

Article | 更新时间：2020-08-12

- Application of multi-mode combined polishing to optical manufacturing
- Optics and Precision Engineering Vol. 19, Issue 1, Pages: 41-50(2011)
- 作者机构：
  
  1. 中国科学院长春光学精密机械与物理研究所中国科学院光学系统先进制造技术重点实验室,吉林长春,130033
  2. 中国科学院研究生院北京,100039
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20111901.0041
  CLC： TQ171.684
- Received：30 March 2010，
  
  Revised：31 May 2010，
  
  Published Online：22 January 2011，
  
  Published：22 January 2011
- 稿件说明：
移动端阅览
宣斌, 谢京江, 宋淑梅. 多模式组合抛光技术在光学加工中的应用[J]. 光学精密工程, 2010,19(1): 41-50

XUAN Bin, XIE Jing-jiang, SONG Shu-mei. Application of multi-mode combined polishing to optical manufacturing[J]. Editorial Office of Optics and Precision Engineering, 2010,19(1): 41-50
宣斌, 谢京江, 宋淑梅. 多模式组合抛光技术在光学加工中的应用[J]. 光学精密工程, 2010,19(1): 41-50 DOI： 10.3788/OPE.20111901.0041.

XUAN Bin, XIE Jing-jiang, SONG Shu-mei. Application of multi-mode combined polishing to optical manufacturing[J]. Editorial Office of Optics and Precision Engineering, 2010,19(1): 41-50 DOI： 10.3788/OPE.20111901.0041.

摘要

介绍了将经典抛光方法与数控加工技术有机结合的多模式组合抛光技术。描述了多模式组合抛光的关键技术之一

材料去除率仿真模型的建立方法。通过设置抛光盘因子和元件因子

多模式组合抛光的材料去除模型不仅包含抛光模式、速度等加工参数

还将抛光模形状、边角效应、元件面形误差等因素对材料去除的影响一并考虑入内

可以根据抛光阶段的不同

选择不同的仿真精度。实验发现

多模式组合抛光可以显著提高加工效率

并且具有较好的对中频误差的抑制和修正能力。多模式组合抛光目前的应用水平大致为球面、平面元件的面形误差达到20 nm(rms)

非球面元件的面形误差达到30~40 nm(rms)左右。结果表明

多模式组合抛光在大口径元件的光学加工方面具有较强的适用性和很大的发展空间。

Abstract

The multi-mode combined polishing technology based on traditional polishing and numerical control polishing methods was introduced. The simulation of material removal rate

one of the key processes of the multi-mode combined polishing

was described in detail. By setting the factors of laps and workpieces

the model for material removal rates involves not only polishing modes and polishing velocity but also the influences of the lap shape

edge effect and surface error on material removal rates. Furthermore

it can choose the different simulation precisions depending on the manufacture process. The practical results show that the multi-mode combined polishing technique provides high polishing efficiency and suppresses and reduces the ripple efficiently. The precision of surface error of optical spheres and flats can reach 20 nm (rms) and those of the aspheres can be 30 nm to 40 nm (rms) so far.Obtained results indicate that the multi-mode combine polishing is a proper technology for the manufacture of large components.

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Keywords

references

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