Operation stability of repetitively pulsed optical pumping sources

HUANG Chao; LIU Jing-ru; YU Li; MA Lian-ying; AN Xiao-xia; ZHU Feng

doi:10.3788/OPE.20111902.0374

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Operation stability of repetitively pulsed optical pumping sources

Article | 更新时间：2020-08-12

- Operation stability of repetitively pulsed optical pumping sources
- Optics and Precision Engineering Vol. 19, Issue 2, Pages: 374-379(2011)
- 作者机构：
  
  西北核技术研究所激光与物质相互作用国家重点实验室,陕西西安 710024
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20111902.0374
  CLC： TN245
- Received：08 October 2010，
  
  Revised：30 October 2010，
  
  Published Online：22 February 2011，
  
  Published：22 February 2011
- 稿件说明：
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黄超, 刘晶儒, 于力, 马连英, 安晓霞, 朱峰. 光泵浦源重频运行稳定性[J]. 光学精密工程, 2011,19(2): 374-379

HUANG Chao, LIU Jing-ru, YU Li, MA Lian-ying, AN Xiao-xia, ZHU Feng. Operation stability of repetitively pulsed optical pumping sources[J]. Editorial Office of Optics and Precision Engineering, 2011,19(2): 374-379
黄超, 刘晶儒, 于力, 马连英, 安晓霞, 朱峰. 光泵浦源重频运行稳定性[J]. 光学精密工程, 2011,19(2): 374-379 DOI： 10.3788/OPE.20111902.0374.

HUANG Chao, LIU Jing-ru, YU Li, MA Lian-ying, AN Xiao-xia, ZHU Feng. Operation stability of repetitively pulsed optical pumping sources[J]. Editorial Office of Optics and Precision Engineering, 2011,19(2): 374-379 DOI： 10.3788/OPE.20111902.0374.

摘要

为了研究表面放电光泵浦源的重频运行稳定性

以高纯度Al

陶瓷作为放电基底

研制了重频分段线性表面放电光泵浦源模块

研究了不同条件下泵浦源模块的放电抖动和辐射强度波动。研究发现

当重复频率在1~10 Hz时

泵浦源的放电抖动主要受充电电压、触发脉冲电压和放电间隙长度的影响

随运行频率的变化较小;辐射强度波动主要与充电电压相关

基本不受混合气体气压和重复频率变化的影响。在合适的条件下

泵浦源的放电抖动

30 ns

辐射强度波动优于2%。研究结果表明

该光泵浦源模块的重频运行稳定性良好。

Abstract

An optical pumping source by segmented surface discharge on a Al

ceramic substrate was developed to reliaze the pulse repetitive stability of surface discharge. The discharge jitter and the deviation of radiation intensity were investigated in detail under different conditions. The experimental results show that the discharge jitter mainly depends on the charging voltage

trigger pulse voltage and the distance of discharge gap

and the pulse repetition rate has a little influence on the discharge jitter in the range of 1 to 10 Hz.Furthermore

the deviation of radiation intensity mainly depends on charging voltage

and does not be affected by the pulse repetition rate and gas pressure. Normally

the discharge jitter can be less than 30 ns

and the deviation of radiaion intensity is below 2%. Research results indicate that the optical pumping source has good discharge stability.

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Keywords

references

YU L, LIU J R, MA L Y, et al.. 10 J energy-level optically pumped XeF(C-A) laser with repetition mode[J]. Optics Letters, 2007,32(9):1087-1089.[2] 于力,朱峰,安晓霞,等. XeF激光光谱研究[J]. 光学学报, 2010,30(3):808-812. YU L, ZHU F, AN X X, et al.. Study on the spectrum of XeF laser[J]. Acta Optica Sinica, 2010,30(3):808-812. (in Chinese)[3] TCHEREMISKINE V I,UTEZA O P,ARISTOV A, et al.. Optical sources based on a multichannel surface discharge and their application to pump photolytically driven femtosecond XeF(C-A) amplifier [J]. SPIE,7005,70051K.[4] TCHEREMISKINE V,UTEZA O,ARISTOV A, et al.. Photolytical XeF(C-A) laser amplifier of femtosecond optical pulses: gain measurements and pump efficiency [J]. Applied Physics B: Lasers and Optics, 2008,91(3-4):447-454.[5] KNECHT B A,FRASER R D, WHEELER D J, et al.. Compact XeF(C-A) and atomic iodine lasers optically pumped by radiation from a surface discharge . International Conference on Atomic and Molecular Pulsed Laser,1995,2619:8-13.[6] ARTEM'EV M Y,BASHKIN A S,MIKHEEV L D, et al.. NF3/H2 and ClF5/H2 chemical HF lasers initiated by radiation from a surface discharge[J]. SPIE. XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 1998,3574:385-396.[7] FULKER D J, CASE A D, VENNER M R W, et al.. An investigation into the optical emission from pulsed planar surface discharges and their application for the pumping of dye lasers [J]. IEEE Pulsed Power Plasma Science, 2001,2:1543-1546.[8] BEVERLY R E Ⅲ. Electrical gasdynamic, and radiative properties of planar surface discharges[J]. Appl.Phys, 1986,60(1):104-124.[9] TUEMA F A, FOURACRE R A,MACGRGOR S J, et al.. An investigation of surface flashover across polymer and ceramic substrates .Conference on Electrical Insulation and Dielectric Phenomena, 2000:43-46.[10] FOURACRE R A,MACGREGOR S J,FULKER D J, et al.. Optical emission properties of pulsed surface discharges[J]. IEEE.Transactions on Plasma Science,2002,30(5):1961-1966.[11] FULKER D J,FOURACRE R A,FINLAYSON A J, et al.. Measurement of the time dependent impedance of pulsed planar surface discharges in a xenon cover gas .Annual Report Conference on Electrical Insulation and Dielectric Phenomena, 2002:546-549.[12] 于力, 易爱平, 刘晶儒,等. 分段表面放电沉积效率研究[J]. 强激光与粒子束, 2003,15(3):209-211. YU L, YI A P, LIU J R, et al.. Study on deposition eff iciency of sectioned surface discharge[J]. High Power Laser and Particl Ebeams, 2003, 15(3):209-211. (in Chinese)[13] YU LI, AN XIAO-XIA, MA LIAN-YING, et al.. Experimental study on the surface discharge optical pumping source with high repetition mode . XVII International Symposium on Gas Flow, Chemical Lasers and High power Lasers SPIE,2008,7131 71310L.

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