Design and manufacture on multilayers of low-Z materials at 14 nm

WU Wen-juan; ZHANG Zhong; ZHU Jing-tao; WANG Feng-li; CHEN Ling-yan; ZHOU Hong-jun; HUO To

doi:10.3788/OPE.20111906.1192

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Design and manufacture on multilayers of low-Z materials at 14 nm

Article | 更新时间：2020-08-12

- Design and manufacture on multilayers of low-Z materials at 14 nm
- Optics and Precision Engineering Vol. 19, Issue 6, Pages: 1192-1198(2011)
- 作者机构：
  
  1. 上海应用技术学院理学院上海,201418
  2. 同济大学精密光学工程技术研究所物理系上海,200092
  3. 中国科技大学国家同步辐射实验室,安徽合肥,230019
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20111906.1192
  CLC： O434;O484.1
- Received：20 January 2011，
  
  Revised：15 February 2011，
  
  Published Online：25 June 2011，
  
  Published：25 June 2011
- 稿件说明：
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吴文娟, 张众, 朱京涛, 王风丽, 陈玲燕, 周洪军, 霍同林. 14nm低原子序数材料多层膜的设计和制备[J]. 光学精密工程, 2011,19(6): 1192-1198

WU Wen-juan, ZHANG Zhong, ZHU Jing-tao, WANG Feng-li, CHEN Ling-yan, ZHOU Hong-jun, HUO Tong-lin. Design and manufacture on multilayers of low-Z materials at 14 nm[J]. Editorial Office of Optics and Precision Engineering, 2011,19(6): 1192-1198
吴文娟, 张众, 朱京涛, 王风丽, 陈玲燕, 周洪军, 霍同林. 14nm低原子序数材料多层膜的设计和制备[J]. 光学精密工程, 2011,19(6): 1192-1198 DOI： 10.3788/OPE.20111906.1192.

WU Wen-juan, ZHANG Zhong, ZHU Jing-tao, WANG Feng-li, CHEN Ling-yan, ZHOU Hong-jun, HUO Tong-lin. Design and manufacture on multilayers of low-Z materials at 14 nm[J]. Editorial Office of Optics and Precision Engineering, 2011,19(6): 1192-1198 DOI： 10.3788/OPE.20111906.1192.

摘要

为了减小常规多层膜的带宽

提高其光谱分辨率

对采用低原子序数材料组成的适用于极紫外和软X射线波段的多层膜进行了研究。首先

在14 nm波长处选取3种低原子序数材料对Si/B

Si/C和Si/SiC组成多层膜

用随机搜索的方法优化设计了这3种多层膜以及在此波段常用的Mo/Si多层膜。然后

用直流磁控溅射的方法制备Si/B

Si/C

Si/SiC和Mo/Si多层膜

并用X射线衍射仪测量拟合多层膜的周期厚度。最后

用同步辐射测试多层膜的反射率。同步辐射测试结果显示

Mo/Si多层膜的带宽最大

为0.57 nm;Si/SiC多层膜的带宽最小

为0.18 nm

结果与理论基本一致。实验结果表明

低原子序数材料多层膜的带宽要比常规Mo/Si多层膜窄

使用低原子序数材料组成多层膜可以提高多层膜的光谱分辨率。

Abstract

In order to decrease the bandwidth of the normal multilayers and improve the spectral resolution

several kinds of multilayers composed of low-

materials were investigated in extreme ultraviolet and soft X-ray regions. Firstly

three kinds of multilayers of low-

materials

Si/B

Si/C and Si/SiC multilayers were chosen at the wavelength of 14 nm and these multilayers and a normal Mo/Si multilayer were designed by using a random search method. Then all these multilayers were fabricated with a DC magnetron sputtering system and the thicknesses were measured by an X-ray diffractometer. Finally

the reflectivities of multilayers were measured by the synchrotron radiation. The synchrotron radiation tests show that the largest bandwidth of these multilayers is from the Mo/Si multilayer in 0.57 nm

and the smallest one is from Si/SiC multilayer in 0.18 nm.The results correspond with the design and demonstrate that the bandwidths of multilayers of low-

materials are narrower than that of the normal Mo/Si multilayer and the multilayers of low-

materials can achieve a higher spectral resolution.

关键词

Keywords

references

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Institute of Precision Optical Engineering， MOE Key Laboratory of Advanced Micro-Structured Materials， Shanghai Frontiers Science Center of Digital Optics， Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications， School of Physics Science and Engineering， Tongji University

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