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Measurement of large aperture SiC flat mirrors by oblique incidence interferometry
Article | 更新时间:2020-08-12
    • Measurement of large aperture SiC flat mirrors by oblique incidence interferometry

    • Optics and Precision Engineering   Vol. 19, Issue 7, Pages: 1437-1443(2011)
    • DOI:10.3788/OPE.20111907.1437    

      CLC: TB92;TH744.3
    • Received:13 September 2010

      Revised:18 November 2010

      Published Online:25 July 2011

      Published:25 July 2011

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  • LIU Zhao-dong, CHEN Lei, HAN Zhi-gang, YAN Qing-wei, ZHU Ri-hong. Measurement of large aperture SiC flat mirrors by oblique incidence interferometry[J]. Editorial Office of Optics and Precision Engineering, 2011,19(7): 1437-1443 DOI: 10.3788/OPE.20111907.1437.

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