Analysis of wave-front error for nanometer pinhole vector diffraction

WANG Li; RAO Chang-hui; RAO Xue-jun

doi:10.3788/OPE.20122003.0499

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Analysis of wave-front error for nanometer pinhole vector diffraction

Article | 更新时间：2020-08-12

- Analysis of wave-front error for nanometer pinhole vector diffraction
- Optics and Precision Engineering Vol. 20, Issue 3, Pages: 499-505(2012)
- 作者机构：
  
  1. 中国科学院光电技术研究所自适应光学国家重点实验室, 四川成都 610209
  2. 中国科学院研究生院, 北京100049
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20122003.0499
  CLC： O436;TQ171.6+5
- Received：20 September 2011，
  
  Revised：11 December 2011，
  
  Published Online：22 March 2012，
  
  Published：22 March 2012
- 稿件说明：
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王俐, 饶长辉, 饶学军. 纳米级针孔矢量衍射波前误差分析[J]. 光学精密工程, 2012,(3): 499-505

WANG Li, RAO Chang-hui, RAO Xue-jun. Analysis of wave-front error for nanometer pinhole vector diffraction[J]. Editorial Office of Optics and Precision Engineering, 2012,(3): 499-505
王俐, 饶长辉, 饶学军. 纳米级针孔矢量衍射波前误差分析[J]. 光学精密工程, 2012,(3): 499-505 DOI： 10.3788/OPE.20122003.0499.

WANG Li, RAO Chang-hui, RAO Xue-jun. Analysis of wave-front error for nanometer pinhole vector diffraction[J]. Editorial Office of Optics and Precision Engineering, 2012,(3): 499-505 DOI： 10.3788/OPE.20122003.0499.

摘要

应用哈特曼-夏克(H-S)波前检测仪检测大数值孔径(NA)透镜时

需要采用纳米级针孔产生参考球面波前对H-S传感器进行标定。为了制作出满足要求的高质量针孔

本文对影响参考波前质量的各种要素进行了仿真计算和分析

以获得最优针孔加工参数。基于矢量衍射理论

在会聚高斯光束照射下

计算了针孔厚度和直径大小对衍射波前误差的影响

衍射波前中的像差成份、能量透过率、强度均匀性、针孔加工误差及光束相对针孔中心发生平移、离焦、倾斜时衍射波前误差的变化。分析计算显示

在NA为0.6时

为了使相对于理想球面波的波峰波谷值(P-V)偏差不大于0.005(=193 nm)

在实际针孔的加工制作中

应选取材料铬

并取厚度200 nm

直径180 nm为适宜。

Abstract

When a Hartmann-Shack(HS) wavefront tester is used to test lenses with high numerical apertures

the spherical reference wavefront from nanometer pinholes should be taken to calibrate the H-S sensor. To fabricate a high quality pinhole

this paper analyzes the factors affecting the quality of reference wavefront to obtain the optimal parameters of the pinhole. The vector diffraction of the pinhole is calculated based on the vector diffraction theory

the effect of the thickness

diameter of the pinhole on the diffraction wavefront errors is analyzed and the aberration

power transmission

intensity uniformity

fabrication errors and incident light with shift

defocus and tilt are discussed under a converging Gaussian incident light. The calculation and analysis show that in order to obtain a reference wavefront with a numerical aperture 0.6 and a peak-to-valley(P-V) value below 0.005(=193 nm)

the best choice for the pinhole is the material chromium with a thickness of 200 nm and a pinhole diameter of 180 nm.

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references

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