Position measuring system in metrological atomic force microscope

Li Wei; GAO Si-tian; LU Ming-zhen; SHI Yu-shu; DU Hua

doi:10.3788/OPE.20122004.0796

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Position measuring system in metrological atomic force microscope

Article | 更新时间：2020-08-12

- Position measuring system in metrological atomic force microscope
- Optics and Precision Engineering Vol. 20, Issue 4, Pages: 796-802(2012)
- 作者机构：
  
  中国计量科学研究院北京,100013
- 作者简介：
- 基金信息：
  
  Supported by Special Fund for Research on Non-profit Industry (No.2007GYJ001)
- DOI：10.3788/OPE.20122004.0796
  CLC： TH742.9
- Received：25 February 2012，
  
  Revised：06 March 2012，
  
  Published Online：22 April 2012，
  
  Published：22 April 2012
- 稿件说明：
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李伟, 高思田, 卢明臻, 施玉书, 杜华. 计量型原子力显微镜的位移测量系统[J]. 光学精密工程, 2012,(4): 796-802

LI Wei, GAO Si-tian, LU Ming-zhen, SHI Yu-shu, DU Hua. Position measuring system in metrological atomic force microscope[J]. Editorial Office of Optics and Precision Engineering, 2012,(4): 796-802
李伟, 高思田, 卢明臻, 施玉书, 杜华. 计量型原子力显微镜的位移测量系统[J]. 光学精密工程, 2012,(4): 796-802 DOI： 10.3788/OPE.20122004.0796.

LI Wei, GAO Si-tian, LU Ming-zhen, SHI Yu-shu, DU Hua. Position measuring system in metrological atomic force microscope[J]. Editorial Office of Optics and Precision Engineering, 2012,(4): 796-802 DOI： 10.3788/OPE.20122004.0796.

摘要

针对纳米结构表征和纳米制造的质量控制需要

中国计量科学研究院设计并搭建了一台计量型原子力显微镜用于纳米几何结构的测量。为了将位移精确溯源到国际单位米

研制了单频8倍程干涉仪测量位移

样品表面形貌则由接触式原子力显微镜测量。一个立方体反射镜与原子力显微镜的测头固定

作为干涉仪的参考镜。两个互相垂直的干涉仪用于测量样品与探针在

x-y

方向的相对位置。样品台置于具有三面反射镜的零膨胀玻璃块上

由压电陶瓷位移台驱动。另外两台干涉仪测量样品与探针在z方向的位移

探针针尖位于干涉仪光束的交点以减小Abbe误差。由于光学器件的缺陷产生的相位混合会引起非线性误差

采用谐波分离法拟合干涉信号来修正误差

修正后干涉仪测量误差减小为0.7 nm。

Abstract

For characterizing the nanostructure and controlling nano-manufacturing quality

a metrological Atomic Force Microscope(AFM) was designed and constructed in National Institute of Metrology. To trace the displacement to the SI unit

the relative position of sample and AFM probe is measured with homodyne 8-pass interferometers and the surface topology of the sample is measured by AFM at a contact mode. A cube with mirrors is fixed on the probe as the reference mirror of interferometers

so that the relative displacement of probe in the

x -y

direction to the sample is measured by interferometers. The sample stage is fixed on a corner block with mirrors on three sides and driven by a piezoelectric motion stage. Two interferometers is used to measure the displacement of sample and probe in

direction. The probe tip is positioned in the intersection of the interferometers in 3 directions to minimize the Abbe error. As the phase mixing from the defect of optical element will cause the nonlinear error

a harmonic separation method is introduced to fit the inteferometric signals and to correct the error. The measured results show that the nonlinear error has been reduced to 0.7 nm

which demonstrates this system has better performance.

关键词

Keywords

references

LEACH R, CHETWYND D, BLUNT L, et al.. Recent advances in traceable nanoscale dimension and force metrology in the UK [J].Measurement Science and Technology, 2006,17(3):467-476.[2] DAI G, WOLFF H, POHLENZ F, et al.. A metrological large range atomic force microscope with improved performance [J].Review of Scientific Instrument, 2009,80(4):043702.[3] KRAMAR J A, DIXSON R, ORJI N G. Scanning probe microscope dimensional metrology at NIST [J].Measurement Science and Technology, 2011,22(2):024001.[4] GONDA S, DOI T, KUROSAWA T, et al.. Real-time, interferometrically measuring atomic force microscope for direct calibration of standards [J].Review of Scientific Instrument, 1999,70(8):3362-3368.[5] YIN B H, CHEN D X, LIN Y S, et al.. Design of AFM system with high speed and large scanning range [J].Opt. Precision Eng., 2011,19(11):2651-2656. (in Chinese)[6] LU M, GAO S, JIN Q, et al.. An atomic force microscope head designed for nanometrology [J]. Measurement Science and Technology, 2007,18(6):1735-1739.[7] DAI G, POHLENZ F, DANZEBRINK H, et al.. Metrological large range scanning probe microscope [J]. Review of Scientific Instrument, 2004,75(4):962-969.[8] KEEM T, GONDA S, MISUMI I, et al.. Removing nonlinearity of a homodyne interferometer by adjusting the gains of its quadrature detector systems [J]. Applied Optics, 2004,43(12):2443-2448.[9] HEYDEMANN P. Determination and correction of quadrature fringe measurement errors in interferometers [J]. Applied Optics, 1981,20(19):3382-3384.[10] DAI G, POHLENZ F, DANZEBRINK H, et al.. Improving the performance of interferometers in metrological scanning probe microscopes [J].Measurement Science and Technology, 2004,15(2):444-450.[11] LU M Z, GAO S T, SHI Y S, et al.. Research in the nonlinearity correction of the homodyne interferometer [J]. Acta Metrologica Sinica, 2010,31(4):289-293. (in Chinese)

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