Displacement measurement method based on integrated grating interferometry with two-wavelength lasers

CHEN Feng; YE Xiong-ying; WU Kang; FENG Jin-yang

doi:10.3788/OPE.20122011.2433

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Displacement measurement method based on integrated grating interferometry with two-wavelength lasers

Article | 更新时间：2020-08-12

- Displacement measurement method based on integrated grating interferometry with two-wavelength lasers
- Optics and Precision Engineering Vol. 20, Issue 11, Pages: 2433-2438(2012)
- 作者机构：
  
  清华大学精密仪器与机械学系精密测试技术及仪器国家重点实验室北京,100084
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20122011.2433
  CLC： TH822;TP212.9
- Received：23 May 2012，
  
  Revised：27 June 2012，
  
  Published：10 November 2012
- 稿件说明：
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陈烽, 叶雄英, 伍康, 冯金扬. 双波长集成光栅干涉微位移测量方法[J]. 光学精密工程, 2012,20(11): 2433-2438

CHEN Feng, YE Xiong-ying, WU Kang, FENG Jin-yang. Displacement measurement method based on integrated grating interferometry with two-wavelength lasers[J]. Editorial Office of Optics and Precision Engineering, 2012,20(11): 2433-2438
陈烽, 叶雄英, 伍康, 冯金扬. 双波长集成光栅干涉微位移测量方法[J]. 光学精密工程, 2012,20(11): 2433-2438 DOI： 10.3788/OPE.20122011.2433.

CHEN Feng, YE Xiong-ying, WU Kang, FENG Jin-yang. Displacement measurement method based on integrated grating interferometry with two-wavelength lasers[J]. Editorial Office of Optics and Precision Engineering, 2012,20(11): 2433-2438 DOI： 10.3788/OPE.20122011.2433.

摘要

介绍了一种基于双波长激光的集成光栅干涉位移检测方法

利用该方法对硅-玻璃键合工艺制作的集成光栅位移敏感芯片进行了测试实验。实验系统主要由敏感芯片、波长为640 nm和660 nm的双波长半导体激光器、双光电二极管及检测电路组成

敏感芯片则由带反射面的可动部件和透明基底上的金属光栅组成。入射激光照射到光栅上产生衍射光斑

衍射光的光强随可动部件与光栅之间的距离变化

通过分别测量两个波长的衍射光强信号并交替切换选取灵敏度较高的输出信号

实现了一定范围内的扩量程位移测量

并得到绝对位置。实验结果表明

利用双波长集成光栅干涉位移检测方法测得敏感芯片可动部件与基底光栅的初始间隙为7.522 m

并实现了间隙从7.522 m到6.904 m区间的高灵敏度位移测量

其噪声等效位移为0.2 nm。

Abstract

A displacement detection method based on two-wavelength grating interferometry was presented. A measurement experiment was carried out by using an integrated grating sensor chip fabricated by silicon-glass bonding bulk process. The measurement setup consisted of a sensor chip

two lasers with wavelengths of 640 nm and 660 nm

two photodetectors and a data acquisition circuit. The sensor chip included moving parts with a reflective surface and a metal grating on the transparent substrate. In experiment

the laser beam illuminated the grating and the grating reflected the laser beam to form a diffraction pattern. As the intensity of the diffracted beams changed according to the displacement between movable structure and substrate

the displacement could be determined with an extended range than single wavelength and the absolute position could be obtained by measuring intensity signals of the two wavelengths respectively. Experimental results show that the initial gap between the moving part and the substrate is about 7.522 m measured by proposed method and it can implement the displacement measurement in a range of 618 nm with a resolution of 0.2 nm.

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references

MANALIS S R, MINNE S C, ATALAR A, et al.. Interdigital cantilevers for atomic force microscopy [J]. Appl. Phys. Lett., 1996, 69(25):3944-3946.[2] YARALIOGLU G G, ATALAR A, MANALIS S R, et al.. Analysis and design of an interdigital cantilever as a displacement sensor [J]. Appl. Phys., 1998, 83(12): 7405-7414.[3] HALL N A, DEGERTEKIN F L. Integrated optical interferometric detection method for micromachined capacitive acoustic transducers[J], Appl. Phys. Lett., 2002,80(20): 3859-3861.[4] LOH N C, SCHMIDT M A, MANALIS S R. Sub-10 cm3 interferometric accelerometer with nano-g resolution [J]. JMEMS, 2002, 11(3): 182-187.[5] TORUN H, UREY H. Uncooled thermo-mechanical detector array with optical readout [J]. Opto-Electron. Rev., 2006,14(1): 55-60.[6] SAVRAN C A, BURG T P, FRITZ J, et al.. Microfabricated mechanical biosensor with inherently differential readout [J]. Appl. Phys. Lett., 2003, 83(8): 1659-1661.[7] TORUN H. A micromachined membrane-based active probe for biomolecular mechanics measurement [J]. Nanotechnology, 2007, 18(16): 53-55.[8] LOH N C, SCHMIDT M A, MANALIS S R. Sub-10 cm interferometric accelerometer with nano-g resolution [J]. Microelectromech. Syst., 2002, 11(3): 182-187.[9] 伍康,叶雄英,陈烽,等. 带有力反馈控制的三明治式微机械干涉加速度计 [J], 纳米技术与精密工程,2011,9(1): 21-25. WU K, YE X Y, CHEN F, et al.. Micromachined sandwich interferometric accelerometer with force feedback control [J]. Nanotechnology and Precision Engineering, 2011, 9(1): 21-25. (in Chinese)[10] GORP B V, ONARAN A G, DEGERTEKIN F L. Integrated dual grating method for extended range interferometric displacement detection in probe microscopy [J]. App. Phys. Lett., 2007, 91(8): 083101-3.[11] FERHANOGLY O, TOY M F, UREY H. Two-wavelength grating interferometry for MEMS sensors [J]. IEEE Photon. Technol. Lett., 2007, 19(23): 1895-1897.[12] FERHANOGLU O, UREY H. Sensitivity enhancement of bimaterial MOEMS thermal imaging sensor array using 2- readout. Proc. SPIE, 2010,7718.[13] SHIN D, KIN B. A laser interferometer encoder with two micromachined gratings generating phase-shifted quadrature [J]. Micromech. Microeng., 2011, 21(8): 085036-1-9.[14] 伍康,叶雄英,刘力涛,等. 集成光栅干涉微位移测量方法研究 [J], 纳米技术与精密工程,2009,7(1):56-59. WU K, YE X Y, LIU L T, et al.. Micro-displacement measurement based on integrated diffraction grating [J]. Nanotechnology and Precision Engineering, 2009,7(1): 56-59. (in Chinese)

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Related Institution

State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084, China

School of Information Science and Engineering， Zhejiang Sci-Tech University

State Key Laboratory of Tribology & Beijing Key Lab of Precision/Ultra-precision Manufacturing Equipments and Control， Department of Mechanical Engineering， Tsinghua University

State Key Laboratory of Tribology & Beijing Key Lab of Precision/Ultra-precision Manufacturing Equipments and Control, Department of Mechanical Engineering, Tsinghua University

Laboratory of Optoelectronic Information Science and Engineering, School of Science, Beijing Jiaotong University

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