Effect of Slurry on Chemical Mechanical Polishing of Decorative Glasses by Fixed-Abrasive Pad

JU Zhi-lan; ZHU Yong-wei; WANG Jian-bin; FAN Ji-long; LI Jun

doi:10.3788/OPE.20132104.0955

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Effect of Slurry on Chemical Mechanical Polishing of Decorative Glasses by Fixed-Abrasive Pad

更新时间：2020-08-12

- Effect of Slurry on Chemical Mechanical Polishing of Decorative Glasses by Fixed-Abrasive Pad
- Optics and Precision Engineering Vol. 21, Issue 4, Pages: 955-962(2013)
- 作者机构：
  
  南京航空航天大学机电学院,江苏南京,210016
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20132104.0955
  CLC： TG74;TN305.2
- Received：25 October 2012，
  
  Revised：15 December 2012，
  
  Published Online：20 April 2013，
  
  Published：15 April 2013
- 稿件说明：
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居志兰朱永伟王建彬樊吉龙李军. 抛光介质对固结磨料化学机械抛光水晶的影响[J]. 光学精密工程, 2013,21(4): 955-962

JU Zhi-lan ZHU Yong-wei WANG Jian-bin FAN Ji-long LI Jun. Effect of Slurry on Chemical Mechanical Polishing of Decorative Glasses by Fixed-Abrasive Pad[J]. Editorial Office of Optics and Precision Engineering, 2013,21(4): 955-962
居志兰朱永伟王建彬樊吉龙李军. 抛光介质对固结磨料化学机械抛光水晶的影响[J]. 光学精密工程, 2013,21(4): 955-962 DOI： 10.3788/OPE.20132104.0955.

JU Zhi-lan ZHU Yong-wei WANG Jian-bin FAN Ji-long LI Jun. Effect of Slurry on Chemical Mechanical Polishing of Decorative Glasses by Fixed-Abrasive Pad[J]. Editorial Office of Optics and Precision Engineering, 2013,21(4): 955-962 DOI： 10.3788/OPE.20132104.0955.

摘要

在固结磨料化学机械抛光中，工件表面与抛光介质易发生水解反应，产生软化层，而软化层厚度直接影响材料去除速率及表面质量。本文采用显微硬度计测量了不同介质条件下水晶表面的变质层厚度，并基于CP-4研磨抛光平台研究了不同抛光介质及温度对材料去除速率的影响，进而在线测量了抛光过程中声发射信号及抛光垫与工件之间摩擦系数的变化。结果表明：六偏磷酸钠的加入可促进水晶玻璃表层网络结构断裂，软化表层，软化层厚度随着浸泡时间、温度升高而增加，进而提高了水晶玻璃的去除率；而且随着温度升高，水解作用更加明显。实验显示，声发射信号及摩擦系数实时测量对抛光工艺参数的优化具有指导意义。

Abstract

In chemical mechanical polishing by a fixed-abrasive pad

the hydrolysis between workpiece and slurries will form a softened layer on the glass substrate to effect on the Material Removal Rate (MRR) and surface quality. The influence of polishing slurries on the surface hardness of decorative glass is analyzed by the micro-hardness method in this paper. The effects of different slurries and temperatures on the MRR were investigated using a CP-4 lapping and polishing platform. Both the dynamic Acoustic Emission (AE) and Coefficient of Friction (COF) were continuously monitored in-situ during the polishing process. The results show that the network structure on the decorative glass surface is collapsed when the sodium hexametaphosphate was added to the slurries

and this layer is softer than the glass

which improved the material removal rate. With the temperature increased

the hydrolysis effect is more obviously. Direct real-time monitoring of AE and COF can offer constructive significance for optimizing process parameters of polishing.

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Keywords

references

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