DIAO Yang, GONG Yan. Selection of system compensators for small scale projected objective[J]. Editorial Office of Optics and Precision Engineering, 2013,21(12): 3029-3036
DIAO Yang, GONG Yan. Selection of system compensators for small scale projected objective[J]. Editorial Office of Optics and Precision Engineering, 2013,21(12): 3029-3036 DOI: 10.3788/OPE.20132112.3029.
Selection of system compensators for small scale projected objective
As the small scale model optical system for a projected objective of lithography has so many optical elements
it is impossible to use a traditional method that each compensator only compensates the corresponding misalignment. Therefore
this paper proposes a sensitive matrix to solve this problem. Firstly
the internal relations between the decenter disalignments and the tip/tilt ones were found out based on a sensitive matrix to reduce the range of selection compensators. Then
according to the analysis of the disalignment sensitivity
a method for selecting system compensators was proposed. With the method
only selected four compensators could allow the imaging quality of compensated optical system to achieve the design index and the alignment difficulty to be reduced. Finally
the macro command modes were proposed to complete the massive simulation calculation to prove the correctness of the sensitive analysis. After the original assembling
a prealigning procedure of optical system was achieved to ensure the feasibility of the aligning scheme. The test results show that the wave front errors (RMS) have reduced to 25.9 nm from 50.9 nm after compensation
which is better than the requirements of qualifications. The results prove that the proposed methods are right and effective.
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[1]王丽萍. 极紫外投影光刻光学系统[J]. 中国光学,2010,3(5):452-461.WANG L P. Optical system of extreme ultraviolet lithography[J]. Chinese Journal of Optics, 2010,3(5):452-461.(in Chinese)[2]FLAGELLO D G,de KLERK J,DAVIES G, et al.. Towards a comprehensive control of full-field image quality in optical photolithography[J]. SPIE, 1997,3051:672-685.[3]巩岩,张巍. 193 nm光刻曝光系统的现状及发展[J]. 中国光学与应用光学,2008,1(1):25-35.GONG Y, ZHANG W. Present status and progress in 193 nm exposure system in lithography[J]. Chinese Journal of Optics and Applied Optics, 2008,1(1):25-35.(in Chinese)[4]刘磊,李景林,吕清涛,等. 大口径反射光学系统装调装置设计研究[J]. 光学 精密工程,2005,13:134-137.LIU L, LI J L, L Q T, et al.. Research on adjusting device of large aperture reflective optics system[J]. Opt. Precision Eng., 2005,13:134-137.(in Chinese)[5]孙敬伟,王建立,陈涛,等. 地平式大口径地基望远镜主光学系统装调技术[J]. 激光与红外,2010,40(3):233-237.SUN J W, WANG J L, CHEN T, et al.. Alignment technology of the large alt-azimuth ground-base telescope main optical system[J]. Laser & Infrared, 2010,40(3):233-237.(in Chinese)[6]李旭阳,李英才,马臻,等. 折轴三反射光学系统的计算机辅助装调技术研究[J]. 应用光学,2009,30(6):901-906.LI X Y, LI Y C, MA ZH, et al.. Computer-aided alignment method of coaxial three-mirror-anastigmat system[J]. Journal of Applied Optics,2009,30(6):901-906.(in Chinese)[7]苗健宇,张立平,翟岩,等. 三线阵CCD立体测绘相机的集成装调[J]. 中国光学,2012,5(4):366-372.MIAO J Y, ZHANG L P, ZHAI Y, et al.. Integrative assembly for three-line array CCD tridimensional mapping camera[J]. Chinese Optics, 2012,5(4):366-372. (in Chinese)[8]张庭成,王涌天,常军,等. 反射变焦系统的计算机辅助装调[J]. 光学学报,2010,30(6):1688-1692.ZHANG T CH, WANG Y T, CHANG J, et al.. Computer-aided alignment for reflective zoom systems[J]. Acta Optica Sinica, 2010,30(6):1688-1692.(in Chinese)[9]LUNDGREN M A,WOLFE W L. Alignment of a three-mirror off-axis telescope by reverse optimization[J]. Optical Engineering, 1991, 30(3):307-311.[10]孙敬伟,陈涛,王建立,等. 主次镜系统的计算机辅助装调[J]. 光学 精密工程,2010,18(10):2156-2163. SUN J W, CHEN T, WANG J L, et al.. Computer-aided alignment for primary and secondary mirrors[J]. Opt. Precision Eng.,2010,18(10):2156-2163.(in Chinese)[11]何红星,赵劲松,潘顺臣. 全反射式无焦ZH系统的装调[J]. 光学 精密工程,2011,19(8):1743-1749.HE H X, ZHAO J S, PAN SH CH. Optical alignment of all-reflective afocal ZH optical system[J]. Opt. Precision Eng.,2011,19(8):1743-1749.(in Chinese)[12]孙敬伟,陈涛,王建立,等. 全基于离焦星点图的RC式望远镜装调技术[J]. 光学 精密工程,2011,19(4):728-736SUN J W, CHEN T, WANG J L, et al.. RC telescope alignment based on out-of-focus stellar image [J]. Opt. Precision Eng.,2011,19(4):728-736.(in Chinese)[13]陈钦芳,李英才,马臻,等. 离轴非球面反射镜补偿检验的计算机辅助装调技术研究[J]. 光子学报,2010,39(12):2220-2223.CHEN Q F, LI Y C, MA ZH, et al.. Computer-aided alignment of off-axis aspheric mirrors in null testing [J].Acta Photonica Sinica, 2010,39(12):2220-2223.(in Chinese)[14]巩盾,田铁印,王红. 利用Zernike系数对离轴三反射系统进行计算机辅助装调[J]. 光学 精密工程,2010,18(8):1754-1759.GONG D, TIAN T Y, WANG H. Computer-aided alignment of off-axis three-mirror system by using Zernike coefficients[J]. Opt. Precision Eng., 2010,18(8):1754-1759.(in Chinese)[15]朱时雨,张新,李威. 计算机辅助装调与传统基准传递技术相结合实现三镜消象散系统的装调[J]. 中国光学,2011,4(6):571-575.ZHU S Y, ZHANG X, LI W. Alignment of off-axis TMA system by combining computer-aided adjustment and traditional benchmark pass method[J]. Chinese Optics, 2011,4(6):571-575. (in Chinese)[16]倪明阳,巩岩. 光刻投影物镜光学元件运动学支撑结构的设计与分析[J]. 中国光学,2012,5(5):476-484.NI M Y, GONG Y. Design and analysis of kinematic lens positioning sturcture in lithographic projection objective[J]. Chinese Optics, 2012,5(5):476-484. (in Chinese)[17]王平,田伟,王汝东,等. 支撑应力对光刻透镜投射波前畸变的影响[J]. 中国光学,2013,6(2):57-63.WANG P, TIAN W, WANG R D, et al.. Influence of mounting stress on wavefront distortion of lithographic object lens[J]. Chinese Optics, 2013,6(2):57-63. (in Chinese)[18]车驰骋,李英才,樊学武,等. 基于矢量波像差理论的计算机辅助装调技术研究[J]. 光子学报,2008,37(8):1630-1634.CHE CH CH, LI Y C, FAN X W, et al.. Research on computer-aided alignment based on vector aberration theory[J]. Acta Photonica Sinica, 2008,37(8):1630-1634.(in Chinese)[19]LIU J F, LONG F N, ZHANG W. Study on computer-aided alignment method[J]. SPIE, 2005, 5638:674-681.[20]薛晓光,李国喜,龚京忠,等. 面向装配过程的精密光学系统计算机辅助装调技术[J]. 计算机集成制造系统,2011,17(10):2163-2170.XUE X G, LI G X, GONG J ZH, et al.. Assembly process oriented computer aided alignment technology of precision optical system [J]. Computer Integrated Manufacturing Systems, 2011,17(10):2163-2170.(in Chinese)[21]YANG H S, KIM S H, LEE Y W, et al.. Computer aided alignment using Zernike coefficients[J]. SPIE, 2006, 6293:6293O1.
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