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Three degrees of freedom modeling and adaptive neural network control for long-stroke wafer stage
更新时间:2020-08-13
    • Three degrees of freedom modeling and adaptive neural network control for long-stroke wafer stage

    • Optics and Precision Engineering   Vol. 23, Issue 1, Pages: 132-140(2015)
    • DOI:10.3788/OPE.20152301.0132    

      CLC: TP273.2;TN305.7
    • Received:04 May 2014

      Revised:04 June 2014

      Published:25 January 2015

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  • WANG Yi-guang, CHEN Xing-lin, LI Xiao-jie. Three degrees of freedom modeling and adaptive neural network control for long-stroke wafer stage[J]. Editorial Office of Optics and Precision Engineering, 2015,23(1): 132-140 DOI: 10.3788/OPE.20152301.0132.

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