To find a suitable method for evaluating electromagnetic shielding properties of metallic mesh coatings
the shielding effectiveness of a general metallic mesh coating was explored. Firstly
a set of the formulas commonly used to calculate the photoelectric characteristics of metallic mesh was analyzed. It points out that the infinite conductive material assumption of formulas is not reasonable
and these formulas can not accurately forecast the electromagnetic shielding effectiveness of thin-film metallic mesh. Then
according to the theory that the shielding effectiveness is associated with the ratio of induction voltage to resistance
a method to estimate the shielding effectiveness of thin-film metallic mesh was proposed by using the shielding effectiveness calculation formula of the continuous conductive film with the square resistance
and the estimation concrete steps were given. Finally
three specimens of thin-film metallic meshes were prepared by the laser direct writing process to test the validity of the method. The results for 30 MHz to 1 500 MHz band show that the highest electromagnetic shielding efficiency of specimens is 30 dB by the coaxial test method
and the calculation value is 31.2 dB by using the method proposed in this paper
as the calculation value is 75 dB by commonly used method. These data indicate that the commonly used electrical characteristic calculation formula of metallic mesh can not accurately evaluate the electromagnetic shielding effectiveness of thin-film metallic mesh
and the method proposed in paper is convenient
accurate and feasible.
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Keywords
references
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Electroless nickel plating of thin copper mesh on K9 substrate
Equivalent refractive index model on shielding effectiveness analysis of high transparency metallic mesh
Influence of substrate on shielding effectiveness of metallic mesh under oblique incidence condition
Mechanism analysis and verification of double-layer micro-nano structure to enhance electromagnetic shielding
Design of electromagnetic compatibility for vehicular optic-electronic equipment
Related Author
GAO Jing-song
LIU Xiao-han
FENG Xiao-guo
ZHAO Jing-li
LU Zhen-gang
TAN Jiu-bin
JIN Peng
LIU Jian
Related Institution
Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics and Fine Mechanics and Physics, Chinese Academy of Sciences
Graduate University of Chinese Academy of Sciences
Institute of Ultra-precision Optoelectronic Instrument Engineering, Harbin Institute of Technology, Harbin 150001,China
Zhongwei United Innovation (Pingtan) Engineering Research Co., Ltd.