Polishing pressure control system for large caliber aspherical optics

FAN Min; LIU Feng; WANG Pei; SHI Wei-ren

doi:10.3788/OPE.20152304.1019

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Polishing pressure control system for large caliber aspherical optics

更新时间：2020-08-13

- Polishing pressure control system for large caliber aspherical optics
- Optics and Precision Engineering Vol. 23, Issue 4, Pages: 1019-1026(2015)
- 作者机构：
  
  重庆大学自动化学院重庆,400030
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20152304.1019
  CLC： TQ171.684;TP273
- Received：13 August 2014，
  
  Revised：25 September 2014，
  
  Published：25 April 2015
- 稿件说明：
移动端阅览
范敏, 刘凤, 王佩等. 大口径非球面光学研抛压力控制系统[J]. 光学精密工程, 2015,23(4): 1019-1026

FAN Min, LIU Feng, WANG Pei etc. Polishing pressure control system for large caliber aspherical optics[J]. Editorial Office of Optics and Precision Engineering, 2015,23(4): 1019-1026
范敏, 刘凤, 王佩等. 大口径非球面光学研抛压力控制系统[J]. 光学精密工程, 2015,23(4): 1019-1026 DOI： 10.3788/OPE.20152304.1019.

FAN Min, LIU Feng, WANG Pei etc. Polishing pressure control system for large caliber aspherical optics[J]. Editorial Office of Optics and Precision Engineering, 2015,23(4): 1019-1026 DOI： 10.3788/OPE.20152304.1019.

摘要

根据大口径非球面光学元件研抛工艺的需求

基于行星式研抛装置设计了一种新型的双路气压平衡研抛压力控制系统。该系统利用低摩擦气缸

压力传感器和两个电气比例阀构建研抛气压闭环回路。分析了系统工作原理

建立了压力控制系统的非线性模型。为了实现恒压控制

运用前馈控制及双模态PID控制算法设计了复合控制器。实验结果表明

该系统能实现研抛压力的平缓过渡

可完成研抛压力的无级调节和柔性控制

输出研抛压力在0到350 N可调

稳态压力波动小于1 N

对气缸活塞位移波动干扰有较强的鲁棒性。该系统基本满足研抛系统对研抛压力稳定性和精确度的要求。

Abstract

According to the demands of large-caliber aspherical optical elements for polishing technology

a kind of dual pressure balanced polishing pressure control system was proposed based on the planet type rotational structure. The closed-loop pressure control system was built by using a low friction cylinder

two electrical proportional valves and several pressure sensors. The nonlinear mathematical model of the pressure control system was built by analyzing experimental values. In order to output a constant pressure

a composite controller was developed by combining with a feedforward control and multiple sets of bimodal PID controls. Experimental results show that the control system achieves grinding pressure smooth transition and implements stepless adjustment and flexible control for the polishing pressure. The output of the pressure is adjustable within the range 0 to 350 N and the steady pressure fluctuation is less than 1 N. The system has stroger robustness against the enough disturbances of a cylinder piston. The system basically meets the stability and accuracy requirements of the polishing pressure.

关键词

Keywords

references

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