Automatic balancing of wavefront aberrations in high-numerical aperture lithographic lenses

XU Ming-fei; HUANG Wei

doi:10.3788/OPE.20152308.2143

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Automatic balancing of wavefront aberrations in high-numerical aperture lithographic lenses

更新时间：2020-08-12

- Automatic balancing of wavefront aberrations in high-numerical aperture lithographic lenses
- Optics and Precision Engineering Vol. 23, Issue 8, Pages: 2143-2148(2015)
- 作者机构：
  
  1. 中国科学院大学北京,中国,100049
  2. 中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春,130033
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20152308.2143
  CLC： TN305.7
- Received：25 August 2014，
  
  Revised：30 September 2014，
  
  Published：25 August 2015
- 稿件说明：
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徐明飞, 黄玮,. 高数值孔径投影光刻物镜波像差的自动平衡优化[J]. 光学精密工程, 2015,23(8): 2143-2148

XU Ming-fei, HUANG Wei,. Automatic balancing of wavefront aberrations in high-numerical aperture lithographic lenses[J]. Editorial Office of Optics and Precision Engineering, 2015,23(8): 2143-2148
徐明飞, 黄玮,. 高数值孔径投影光刻物镜波像差的自动平衡优化[J]. 光学精密工程, 2015,23(8): 2143-2148 DOI： 10.3788/OPE.20152308.2143.

XU Ming-fei, HUANG Wei,. Automatic balancing of wavefront aberrations in high-numerical aperture lithographic lenses[J]. Editorial Office of Optics and Precision Engineering, 2015,23(8): 2143-2148 DOI： 10.3788/OPE.20152308.2143.

摘要

考虑高数值孔径(NA)投影光刻物镜视场较大、波像差分布不均匀

本文提出了一种自动优化设计方法来降低设计过程中出现的全视场最大波像差。该方法通过将一个自动调节采样视场权重的循环程序附加在光刻物镜的局部优化程序之外来自动平衡全视场的波像差

进而降低全视场的最大波像差。设计实例证明

运用该方法后光刻物镜全视场波像差的均匀性显著提高

最大波像差降低为原来的63%。该方法在光学设计软件CodeV中有良好的应用效果

应用该方法不但能节省光刻物镜设计者的时间

而且会降低设计对设计者设计经验的依赖性。同时

该方法也可推广应用在其他对成像质量要求较高的光学系统设计中。

Abstract

As high-numerical aperture (NA) lithographic lenses have larger fields of view(FOVs) and nonuniform wavefront aberration distributions

this paper proposes an automatic optimized design method to reduce the the largest wavefront aberration of all FOVs in design processing. The method adds an external loop optimization procedure which can automatically adjust sampling weight into the local optimization procedure of a lithographic lens to balance wavefront aberrations and to reduce the largest wavefront aberration automatically. By using the proposed method

the uniformity of wavefront aberrations gets better and the largest wavefront aberration has been reduced to 63% of the primary value. It shows that the method has a better application in Code V. Meanwhile

it not only reduces the design time consumption but also the dependence on the design experiences of the designers. this method can also be applied in design of other optical systems with higher imaging quality.

关键词

Keywords

references

MA B, LI L, HUANG Y F, CHANG J, et al.. Application and influence of aspheric surfaces in lithographic objectives design [J]. SPIE, 2010, 7657:76570A.

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CHENG D, WANG Y T, HUA H. Automatic image performance balancing in lens optimization [J]. Optics Express, 2010,18(11):11574-11588.

孙靖民,梁迎春.机械优化设计[D]. 北京:机械工业出版社,2006. SUN J M, LIANG Y CH. Optimal Design of Machine [D]. Beijing: China Machine Press, 2006. (in Chinese)

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MASAKI I, LEO G, GROOT G. Automated control of manufacturing sensitivity during optimization [J]. SPIE, 2004,5249:343-352.

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