HAN Li-xiang, HUA Wei, MA Jian-she etc. MEMS manufacture process of high precision quartz hologram lens[J]. Editorial Office of Optics and Precision Engineering, 2015,23(11): 3107-3113
HAN Li-xiang, HUA Wei, MA Jian-she etc. MEMS manufacture process of high precision quartz hologram lens[J]. Editorial Office of Optics and Precision Engineering, 2015,23(11): 3107-3113 DOI: 10.3788/OPE.20152311.3107.
MEMS manufacture process of high precision quartz hologram lens
An over-sized monolithic holographic lens with a micron plane precision of 0.4
μ
m is fabricated on a quartz substrate well polished by Micro-electro-mechanical system(MEMs) process. Some improved methods are used in this series process
such as the stepper projection exposure with a resolution of 0.2
μ
m and the stitching method
the improved ICP(Inductively Coupled Plasma)dry etching technology for a quartz
the physical cleaning method designed especially and a lot of other supporting processes. The ideal surface shape curve of cross section for the hologram lens is a piecewise parabola. A single lens is horizontally arrayed by 23 column cell structures with a width about 2.966 mm. Because of the difficulty in practice
the 4-step structure with an equal depth and an unequal width is used to fit it. At last
single piece square hologram lenses with the area more than 68 mm×68 mm are obtained at a 4 in(10.16 cm)circle piece. The step profiler
scanning electron microscope
high-powered and resolution optical microscope are used to measure lens accuracy at different stages. The results indicate that the lens has a plane precision of 0.4
μ
m
vertical precision of 30 nm
and shows a good vertical wall shape and etching uniformity. This process technology can be used for small batch production
and the cost is moderate. It is suitable for processing the same grade lenses with the size of 6 in(15.24 cm)
and also for processing the sapphire substrates.
关键词
Keywords
references
BERNHARDT M, WYROWSKI F, BRYNGDAHL O. Iterative techniques to integrate different optical functions in a diffractive phase element[J]. Appl Opt., 1991, 30(32):4629-4635.
李路明, 王立鼎. MEMS研究的新进展——微型系统及其发展应用的研究[J]. 光学 精密工程,1997, 5(1):67-73. LI L M, WANG L D. Micro system and its Development an d Applications[J]. Opt. Precision Eng.,1997, 5(1):67-73.(in Chinese)
杨国桢, 顾本源. 衍射光学元件的设计方法[J]. 物理,1994,23(4):200-205. YANG G ZH, GU B Y. Diffractive phase element design procedure[J]. Physics, 1994,23(4):200-205.(in Chinese)
CHARLES A H. Electronic Materials and Processes Handbook[M]. America:McGraw-Hill Companies, 2004.
MICHAEL Q, JULIAN S. Semiconductor Manufacturing Technology[M]. Beijing:Publishing House of Electronics Industry,2006.
STEPHEN A C. The Science and Engineering of Microelectronic Fabrication[M]. Britain:Oxford University Press,Inc.,2001.
韩励想,李占奎,鲁皖,等. 双面二维硅微条探测器的沾污失效分析及修复[J]. 光学 精密工程,2010, 18(12):2616-2623. HAN L X, LI Z K, LU W,et al.. Contamination failure analysis andrepairing for double side two dimensional silicon micro strip detectors[J]. Opt. Precision Eng., 2010, 18(12):2616-2623.(in Chinese)
KOJI I. Biomedical micro device fabricated by micro stereo lithography. sixth international symposiumon micro machine and human science[C].IEEE,1995:67-70.
赵玉清. 电子束离子束技术[M]. 西安:西安交通大学出版社,2002:222-228. ZHAO Y Q. Electron Beam and Ion Beam Techonlogy[M]. Xi'an:Xi'an Jiaotong University Press, 2002:222-228.(in Chinese)
韩励想,李占奎,靳根明. 用于半导体探测器研制的数字摄影显微系统[J]. 核电子学与探测技术,2009,29(5):945-949. HAN L X, LI ZH K, JIN G M, et al.. The system of digital-image optical microscope in semiconductor particle detector development[J]. Nuclear Electronics and Detection Technology, 2009,29(5):945-949(in Chinese)
达道安. 真空手册[M]. 北京,国防工业出版社,2004:834-915. DAa D A. Vacuum Manual[M]. Beijing:Defence industry Press, 2004:834-915.(in Chinese)
张雷,杨勇,赵星,等. 基于小发散角的投影式集成成像三维显示再现深度的拓展[J]. 光学 精密工程,2012,20(6):1159-1165. ZHANG L, YANG Y, ZHAO X,et al.. Enhancement of field depth for projection-type integral imaging 3D display based on small diverging angle[J]. Opt. Precision Eng.,2012,20(6):1159-1165.(in Chinese)