LU Wen-zhuang, YANG Bin, FENG Wei etc. Lapping of sapphire wafers by CVD diamond coated tools[J]. Editorial Office of Optics and Precision Engineering, 2016,24(3): 540-546
LU Wen-zhuang, YANG Bin, FENG Wei etc. Lapping of sapphire wafers by CVD diamond coated tools[J]. Editorial Office of Optics and Precision Engineering, 2016,24(3): 540-546 DOI: 10.3788/OPE.20162403.0540.
Lapping of sapphire wafers by CVD diamond coated tools
Three kinds of Chemical Vapor Deposition(CVD) diamond coated tools with different surface morphologies(including spherical structure crystal
incisive pyramid crystal and quadrangular prism crystal) were prepared by Hot Filament Chemical Vapor Deposition(HFCVD) method to improve the lapping efficiency of CVD diamond coated tools in sapphire wafer processing. The influences of process parameters such as diamond coating grain morphology
lapping load
velocity of operating platform and lapping time on the removal rates and surface roughnesses were researched The results show that the diamond coating grain morphology has great impact on the material removal rate and surface roughness. Moreover
the diamond coated tool with spherical crystal structure has a lower tangential force
while the diamond coated tool with quadrangular prism structure offers a higher tangential force. When the diamond coated tool with quadrangular prism structure is selected to lap sapphire wafers
and the process parameters are lapping load in 0.15 MPa
the velocity of operating platform in 100 r/min and lapping time in 3 min
the maximum material removal rate reaches to 0.397μm/min and the surface roughness is 0.354μm. It concludes that the CVD diamond coated tools are suitable for machining and lapping sapphire wafers and can remove the scratches on the surface of sapphire wafers and improve their surface qualities.
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references
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