CHU Jin-kui, LI Shuang-liang, ZHANG Ran. Micro-measurement of SU-8 photoelastic performance[J]. Editorial Office of Optics and Precision Engineering, 2016,24(3): 547-552
The photoelastic performance of SU-8 photoresist is related to extending its applications to the field of MEMS(Micro-electronic-mechanical System). Therefore
this paper designs a micro-measuring path to obtain the stress-optical coefficient of the SU-8
and implements the measurement experiment of SU-8 photoelastic performance. Firstly
based on the photoelastic mechanism
the micro-measuring optical path was designed and the formulas for the calculation of SU-8 stress-optical coefficient were deduced. Then
the experiment devices for photoelastic microscopic measurement were built according to the designed optical path
and the tensile test of SU-8 specimen was conducted in the scope of the half order of a single photoelastic fringe. Finally
through extracting the values of the light intensity from the experimental photographs by Matlab
the light intensity of monochromatic light penetrated throught the SU-8 specimen under different tensile forces were measured and the value of SU-8 stress-optical coefficient was calculated. The experimental results and the calculation of measurement formulas show that the stress-optical coefficient of SU-8 is(3.007±0.149)×10
-11
m
2
/N
greater than that of normal optical glass and other materials commonly used in MEMS fields
such as silica. The experimental results can lay a foundation for the design and manufacturing of micro-grippers and micro-probes made from the SU-8 materials and used for the force measurement through photoelastic mechanisms.
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