Structure design of nanometer positioning stage with a large stroke

CHEN Qi

doi:10.3788/OPE.20162405.1065

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Structure design of nanometer positioning stage with a large stroke

更新时间：2020-08-13

- Structure design of nanometer positioning stage with a large stroke
- Optics and Precision Engineering Vol. 24, Issue 5, Pages: 1065-1071(2016)
- 作者机构：
  
  中国科学院长春光学精密机械与物理研究所,吉林长春,中国,130033
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20162405.1065
  CLC： TH703;TN305.7
- Received：21 October 2015，
  
  Revised：05 December 2015，
  
  Published：25 May 2016
- 稿件说明：
移动端阅览
陈琦,. 大行程纳米级定位工作台的结构设计[J]. 光学精密工程, 2016,24(5): 1065-1071

CHEN Qi,. Structure design of nanometer positioning stage with a large stroke[J]. Editorial Office of Optics and Precision Engineering, 2016,24(5): 1065-1071
陈琦,. 大行程纳米级定位工作台的结构设计[J]. 光学精密工程, 2016,24(5): 1065-1071 DOI： 10.3788/OPE.20162405.1065.

CHEN Qi,. Structure design of nanometer positioning stage with a large stroke[J]. Editorial Office of Optics and Precision Engineering, 2016,24(5): 1065-1071 DOI： 10.3788/OPE.20162405.1065.

摘要

考虑采用静态三步拼接曝光法的扫描干涉场曝光系统的性能与工作台的定位精度及稳定性相关

设计了一种大行程、高精度二维工作台以提高其定位精度。采用摩擦驱动和压电陶瓷微位移机构组合的方式构成宏、微进给机构

由闭式气体静压导轨带动工作台实现沿

、

两个方向的光栅分度与扫描运动。优化设计了摩擦驱动机构和气体静压导轨结构

并对工作台整体结构固有频率进行了有限元分析。使用自准直仪检测了导轨在

、

方向的直线性

结果显示其两方向偏航和俯仰精度均在±0.04

m以内。使用激光干涉仪检测了导轨在

方向的定位精度和定位噪声

结果表明

对

向行程为220 mm、

向行程为300 mm的工作台

其

方向的定位精度优于±5 nm

定位稳定性可达±25 nm。得到的结果满足扫描干涉场曝光系统工作台纳米级定位精度的要求。

Abstract

As the performance of a scanning interference field lithographic system using static three-step splicing exposure method is related to the positioning accuracy and stability

this paper designs a 2D positioning stage with a large stroke to achieve high positioning accuracy. The friction drive and piezoelectric ceramic micro displacement mechanism were combined to form a macro-micro feed mechanism. A closed gas hydrostatic guideway was used to drive the stage to implement the raster indexing and scanning movement along

directions. The friction driving mechanism and aerostatic bearing structure were optimally designed in detail

and the natural frequency of overall structure of the stage was calculated by finite element analysis. An autocollimator was used to test the linearity of the guideways in

directions

and results show that yaw and pitch accuracy in both directions are within ±0.04

m. A laser interferometer was taken to detect the positioning accuracy and positioning noise of the guideway in

direction and the result shows that for the stage with a stroke of 220 mm in

direction and 300 mm in

direction

the positioning accuracy of

direction is better than ±5 nm

and the positional stability is better than ±25 nm

meeting the requirements of scanning interference field exposure system stage for nanometer positioning precision.

关键词

Keywords

references

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