Adsorption of TiO<sub>2</sub> nanoparticles on monocrystalline silicon surface

Xiao-zong SONG; Gui GAO; You-xin ZHOU; Hong-gang WANG; Jun GONG

doi:10.3788/OPE.20162407.1694

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Adsorption of TiO₂ nanoparticles on monocrystalline silicon surface

Micro/Nano Technology and Fine Mechanics | 更新时间：2020-08-13

- Adsorption of TiO₂ nanoparticles on monocrystalline silicon surface
- Optics and Precision Engineering Vol. 24, Issue 7, Pages: 1694-1702(2016)
- 作者机构：
  
  1.兰州理工大学机电工程学院, 甘肃兰州 730050
  2.中国科学院兰州化学物理研究所固体润滑国家重点实验室, 甘肃兰州 730000
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20162407.1694
  CLC： TB302;TB383
- Received：10 March 2016，
  
  Accepted：11 April 2016，
  
  Published：2016-07
- 稿件说明：
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Xiao-zong SONG, Gui GAO, You-xin ZHOU, et al. Adsorption of TiO₂ nanoparticles on monocrystalline silicon surface[J]. Optics and precision engineering, 2016, 24(7): 1694-1702.
DOI：

Xiao-zong SONG, Gui GAO, You-xin ZHOU, et al. Adsorption of TiO₂ nanoparticles on monocrystalline silicon surface[J]. Optics and precision engineering, 2016, 24(7): 1694-1702. DOI： 10.3788/OPE.20162407.1694.

摘要

为了实现亚纳米级超光滑表面的加工，建立了紫外光诱导纳米颗粒胶体射流加工系统，同时研究了加工过程中纳米颗粒与工件表面间的相互作用机理。首先，对实验所用锐钛矿TiO

纳米颗粒及单晶硅工件表面进行表征测量。然后，用第一性原理的平面波赝势计算方法研究了纳米颗粒胶体射流加工中TiO

分子团簇在单晶硅表面化学吸附的表面构型结构及其体系能量。最后，开展了TiO

纳米颗粒及单晶硅工件表面间的吸附实验。实验结果表明：胶体中的OH基团在TiO

团簇表面及单晶硅表面分别发生化学吸附，在TiO

纳米颗粒及单晶硅表面吸附过程中形成了新的Ti-O-Si键及化学吸附的H

O分子。红外光谱实验结果显示:TiO

纳米颗粒与单晶硅界面间存在新生成的Ti-O-Si键。这种界面间的相互作用证实了紫外光诱导纳米颗粒胶体射流抛光过程可实现材料去除的化学作用机理。

Abstract

To efficiently create the ultra-smooth surface of brittle crystals

an ultraviolet induced nanoparticle colloid jet machining system was established and the interaction mechanism between the nanoparticles and the surface of a workpiece in the process was investigated. Firstly

the characteristics of TiO

nanoparticles and monocrystalline silicon surface used in the experiment were measured and investigated. Then

the plane-wave pseudopotential calculation method based on first-principles was used to study the geometrical structures and formation energies of TiO

molecular cluster in chemically adsorbing on hydroxyl monocrystalline silicon surface. Finally

adsorption experiments of TiO

nanoparticles and monocrystalline silicon surface were carried out. Calculation results show that the OH is chemically adsorbed on TiO

cluster and silicon surface

respectively. In the adsorption process between TiO

nanoparticles and silicon surface

new Ti-O-Si bonds and H

O molecule are formed to reduce the system energy. Infrared spectral experiment results also show that there exits a new generation of Ti-O-Si bond between the interfaces of TiO

nanoparticles and silicon surface. The new chemical bond between the interfaces satisfies the chemical reaction mechanism in the process of ultraviolet induced nanoparticle colloid jet machining.

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Keywords

references

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Adsorption of TiO2 nanoparticles on monocrystalline silicon surface

DOI：10.3788/OPE.20162407.1694

摘要

Abstract

关键词

Keywords

references

Adsorption of TiO₂ nanoparticles on monocrystalline silicon surface