Sub-nanometer precision optical fabrication of CaF<sub>2</sub> materials

Chun-lei ZHANG; Le XU; Jian LIU; Zhan-long MA; Fei WANG; Yong-qiang GU; Lei DAI; Shi-jun PENG

doi:10.3788/OPE.20162411.2636

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Sub-nanometer precision optical fabrication of CaF₂ materials

Modern Applied Optics | 更新时间：2020-07-07

- Sub-nanometer precision optical fabrication of CaF₂ materials
- Optics and Precision Engineering Vol. 24, Issue 11, Pages: 2636-2643(2016)
- 作者机构：
  
  中国科学院长春光学精密机械与物理研究所超精密光学工程研究中心, 吉林长春 130033
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20162411.2636
  CLC： TN305.2;TH703
- Received：26 April 2016，
  
  Accepted：14 June 2016，
  
  Published：25 November 2016
- 稿件说明：
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Chun-lei ZHANG, Le XU, Jian LIU, et al. Sub-nanometer precision optical fabrication of CaF₂ materials[J]. Optics and precision engineering, 2016, 24(11): 2636-2643.
DOI：

Chun-lei ZHANG, Le XU, Jian LIU, et al. Sub-nanometer precision optical fabrication of CaF₂ materials[J]. Optics and precision engineering, 2016, 24(11): 2636-2643. DOI： 10.3788/OPE.20162411.2636.

摘要

考虑用CaF

材料制作投影光刻物镜可以明显提高其性能指标，本文研究了CaF

材料加工工艺的全流程，以实现CaF

材料的全频段高精度加工。首先，利用沥青抛光膜和金刚石微粉使CaF

元件有较好的面形和表面质量。然后，优化转速、抛光盘移动范围、压力等加工工艺参数，并使用硅溶胶溶液抛光进一步降低CaF

元件的高频误差，逐渐去除加工中产生的划痕并且获得极小中频误差（Zernike残差）和高频粗糙度。最后，在不改变CaF

元件高频误差的同时利用离子束加工精修元件面形。对100 mm口径氟化钙材料平面进行了加工和测试。结果表明：其Zernike 37项拟合面形误差RMS值可达0.39 nm，Zernike残差RMS值为0.43 nm，高频粗糙度均值为0.31 nm，实现了对CaF

元件的亚纳米精度加工，为研发高性能深紫外投影光刻物镜奠定了良好基础。

Abstract

When CaF

materials are used in projection lenses

the performance of the projection lenses can be improved greatly. This paper researches the process of CaF

crystal fabrication to realize its high precision optical fabrication in all wave bands. Firstly

the pitch lap and the diamond powder were used to get a relative better figure and surface quality of a CaF

element. Then

the technological parameters of the polishing lap

such as rotation speed

movement range and pressure were optimized

and the colloidal silica was used in polishing to reduce the high frequency errors in the CaF

element

remove the scratch in machining and to obtain a smaller mid-spatial error and smaller higher frequency roughness. Finally

the ion beam figuring technique was used to repair finely the surface figure of the element meanwhile maintaining the high frequency error in the CaF

element. The Experiments were conduct on a CaF

crystal plane with a diameter of 100 mm

and the results indicate that its 37 Zernike fit error and the Zernike residual error reach to 0.39 nm RMS and 0.43 nm RMS

respectively

and the roughness reaches to 0.31 nm on average. These results satisfy the nanometer machining requirements of the projection lens

and lay a basis for development of the high performance projection lenses.

关键词

Keywords

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Sub-nanometer precision optical fabrication of CaF2 materials

DOI：10.3788/OPE.20162411.2636

摘要

Abstract

关键词

Keywords

references

Sub-nanometer precision optical fabrication of CaF₂ materials