Effect of chemical modification technology laser damage threshold of fused silica optical elements

Zhi-gang YUAN; Ya-guo LI; Xian-hua CHEN; Xi XU; Shi-jie ZHAO; Lian ZHOU

doi:10.3788/OPE.20162412.2956

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Effect of chemical modification technology laser damage threshold of fused silica optical elements

High Power Laser Optical Componets | 更新时间：2020-08-13

- Effect of chemical modification technology laser damage threshold of fused silica optical elements
- Optics and Precision Engineering Vol. 24, Issue 12, Pages: 2956-2961(2016)
- 作者机构：
  
  成都精密光学工程研究中心, 四川成都 610041
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20162412.2956
  CLC： TQ171.734;TN305.2
- Received：02 November 2016，
  
  Accepted：07 December 2016，
  
  Published：25 December 2016
- 稿件说明：
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Zhi-gang YUAN, Ya-guo LI, Xian-hua CHEN, et al. Effect of chemical modification technology laser damage threshold of fused silica optical elements[J]. Optics and precision engineering, 2016, 24(12): 2956-2961.
DOI：

Zhi-gang YUAN, Ya-guo LI, Xian-hua CHEN, et al. Effect of chemical modification technology laser damage threshold of fused silica optical elements[J]. Optics and precision engineering, 2016, 24(12): 2956-2961. DOI： 10.3788/OPE.20162412.2956.

摘要

针对355 nm激光作用于熔石英光学元件后其损伤阈值容易变差的问题，提出使用1.7%纯HF溶液和0.4% HF与1.2% NH

F混合的BOE溶液对样品进行处理来提高它们的激光诱导损伤阈值（LIDT）。在相同的条件下将熔石英光学元件浸没到上述两种不同的刻蚀溶液中进行处理，通过测量刻蚀过程中元件重量变化来计算刻蚀速率，利用Zygo轮廓仪测试元件表面粗糙度，然后对355 nm激光照射下熔石英元件的损伤阈值情况进行研究。损伤测试表明，LIDT与元件的材料去除深度有关系，用两种刻蚀液刻蚀去除一定深度后，LIDT均有增加，但是进一步去除会显著地降低元件的LIDT。在处理过程中，这两种刻蚀液的去除速率都很稳定，分别为85.9 nm/min和58.6 nm/min左右。另外，元件表面的粗糙度会随着刻蚀时间的增加而变大。在刻蚀过程中还通过纳米技术测量了熔石英元件表面的硬度及杨氏系数，不过没有证据表明其与激光诱导损伤有明确的关系。

Abstract

The Laser-induced Damage Thresholds (LIDTs) of fused silica optical elements would be deteriorate

when it suffers the 355 nm laser irradiation. This paper proposes a method to improve their LIDTs. A silica element was immersed into two types of HF-based etchants:1.7%wt. HF acid and buffer oxide etchant (BOE:the mixture of 0.4%wt. HF and 12%wt. NH

F) to be treated in the same experimental condition

respectively. The etching rate was calculated by measuring the weight variation of the etching element during the etching process

and the surface roughness of the element was tested by a Zygo contourgraph. Then

the LIDT characteristics of the fused quartz element under the 355 nm laser irradiation were studied. The damage testing shows that the LIDT is relative to the depth of material removal. Both the etchants increase the LIDT at a certain depth of material removal

but further removal of material lowers the LIDT markedly. The etching rates of both etchants keep steady in our processing procedure

they are~85.9 nm/min and~58.6 nm/min

respectively. The micro-surface roughness (RMS

PV) increases as etching time extended. Furthermore

the hardness and Young's modulus of the fused silica etched were measured by a nano-indenter

and there is no solid evidence that LIDT can be related to hardness or Young's modulus.

关键词

Keywords

references

NEAUPORT J, AMBARD C, BERCEGOL H, et al .. Optimizing fused silica polishing processes for 351 nm high power laser application[J]. SPIE, 2008, 7312:1-5.

SHEN N, MILLER P E, BUDE J D, et al .. Thermal annealing of laser damage precursors on fused silica surfaces[J]. Opt. Eng., 2012, 51(12):121817.

SURATWALA T I, MILLER P E, BUDE J D, et al .. HF-Based etching processes for improving laser damage resistance of fused silica optical surfaces[J]. J.Am.Ceram.Soc., 2011, 94(2):416-428.

范敏, 刘凤, 王佩, 等.大口径非球面光学研抛压力控制系统[J].光学精密工程, 2015, 23(4):1019-1026.

FAN M, LIU F, WANG P, et al ..Polishing pressure control system for large caliber aspherical optics[J]. Opt. Precision Eng., 2015, 23(4):1019-1026. (in Chinese)

王飞, 张健, 彭利荣, 等.气囊抛光过程的运动精密控制[J].光学精密工程, 2015, 23(8):2220-2228.

WANG F, ZHANG J, PENG L R, et al ..Motion-precision control in bonnet-polishing[J]. Opt. Precision Eng., 2015, 23(8):2220-2228. (in Chinese)

NEAUPORT J, LAMAIGNERE L, BERCEGOL H. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm[J]. Opt. Express, 2005, 13(25):10163-10171.

BAXAMUSA S, MILLER P E, WONG L, et al .. Mitigation of organic laser damage precursors from chemical processing of fused silica[J]. Opt. Express, 2014, 22(24):29568-29577.

项震, 侯晶, 聂传继, 等.化学刻蚀的光学元件面形修复[J].光学精密工程, 2007, 15(7):997-1001.

XIANG ZH, HOU J, NIE CH J, et al ..Form error of optical surface repaired by wet-etch fiuring[J]. Opt. Precision Eng., 2007, 15(7):997-1001. (in Chinese)

SPIERINGS G.Wet chemical etching of silicate glasses in hydrofluoric acid based solution[J]. J. Mater. Sci., 1993, 28:6261-6273.

VERHAVERBEKE S, TEERLINCK I, VINCKIER C, et al .. The etching mechanism of SiO 2 in hydrofluorica cid[J]. Electrochem.Soc., 1994, 141(10):2852-2857.

KNOTTER D M. Etching mechanism of vitreous silicon dioxide in HF-based solutions[J].J. Amer. Chem. Soc., 2000, 122:4345-4351.

ZHENG Z, ZU X T, JIANG X D, et al .. Effect of HF etching on the surface quality and laser-induced damage of fused silica[J]. Opt. Laser Technol., 2012, 44:1039-1042.

BUDE J, MILLER P, BAXAMUSA S, et al .. High fluence laser damage precursors and their mitigation in fused silica[J].Opt. Express, 2014, 22(5):5839-5841.

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