Ming-jin XU, Yi-fan DAI, Xu-hui XIE, et al. Error analysis of ion beam figuring for fabrication of continuous phase plates with small feature structures[J]. Optics and precision engineering, 2016, 24(12): 2975-2982.
DOI:
Ming-jin XU, Yi-fan DAI, Xu-hui XIE, et al. Error analysis of ion beam figuring for fabrication of continuous phase plates with small feature structures[J]. Optics and precision engineering, 2016, 24(12): 2975-2982. DOI: 10.3788/OPE.20162412.2975.
Error analysis of ion beam figuring for fabrication of continuous phase plates with small feature structures
According to the surface characteristics of continuous phase plates with small feature structures on high surface gradients and extensive mid-to-high spatial frequencies
several factors influencing the machining accuracy of the phase plates are analyzed. These factors include raster scanning pitch
material removal programming
positioning precision and material removal. The analysis points out that the optimal pitch can be selected according to the Nyquist sampling theorem to achieve the effective imprinting of feature structures with different sizes. When the surface errors in all spatial frequency ranges are controlled effectively
the stable dwell time can be achieved during the raster scanning process by the optimized material removal programming. Furthermore
when the surface matching method is used to correct the measurement errors
the accurate material removal information can be obtained. When the positioning precision of the removal accuracy is increased
the machining accuracy of the element with small feature structures can be improved significantly. Finally
on the basis of eliminating of different process errors
the Ion Beam Fabrication (IBF) is adopted to imprint the complex phase structures with characteristic dimensions as small as 1.5 mm
surface peak-to-valley (PV) smaller than 200 nm and surface gradient as large as 1.8
μ
m/cm. The results show that the matching error between figured surface and desired surface has been controlled down to 8.1 nm (Root-Mean-Square
RMS) of design specifications. The experimental results verify the reliability of the error analysis.
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