Effects of posttreatments on optical properties and laser induced damage thresholds of HfO<sub>2</sub> thin films

Qian WU; Jin LUO; Feng PAN

doi:10.3788/OPE.20162412.3000

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Effects of posttreatments on optical properties and laser induced damage thresholds of HfO₂ thin films

High Power Laser Optical Componets | 更新时间：2020-08-13

- Effects of posttreatments on optical properties and laser induced damage thresholds of HfO₂ thin films
- Optics and Precision Engineering Vol. 24, Issue 12, Pages: 3000-3004(2016)
- 作者机构：
  
  成都精密光学工程研究中心, 四川成都 610000
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20162412.3000
  CLC： O484.41
- Received：08 October 2016，
  
  Accepted：30 November 2016，
  
  Published：25 December 2016
- 稿件说明：
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Qian WU, Jin LUO, Feng PAN. Effects of posttreatments on optical properties and laser induced damage thresholds of HfO₂ thin films[J]. Optics and precision engineering, 2016, 24(12): 3000-3004.
DOI：

Qian WU, Jin LUO, Feng PAN. Effects of posttreatments on optical properties and laser induced damage thresholds of HfO₂ thin films[J]. Optics and precision engineering, 2016, 24(12): 3000-3004. DOI： 10.3788/OPE.20162412.3000.

摘要

利用电子束蒸发技术制备了氧化铪薄膜，并分别用氧气氛下退火和激光预处理两种后处理方法对样品进行了处理。介绍了两种后处理工艺和相关的设备，测试分析了样品的透过率、吸收和抗激光损伤阈值。对比了两种后处理方法对降低吸收和提高激光损伤阈值的效果，讨论了它们的作用原理。实验结果表明，激光预处理能有效降低样品的吸收值，提高样品的抗激光损伤阈值。采用一步法（50%初始损伤阈值）预处理后，三倍频氧化铪薄膜的损伤阈值从13 J/cm

提升到15 J/cm

；采用两步法（依次50%、80%初始损伤阈值）预处理后，三倍频氧化铪薄膜的损伤阈值从13 J/cm

提升到17.5 J/cm

，损伤几率曲线整体向高通量区域平移。

Abstract

HfO

thin films were prepared by electron beam evaporation technique. Two kinds of post-treatment methods

anneal in oxygen and laser treatment

were employed to treat the samples under the oxygen condition. The procedures of post-treatment and corresponding treatment equipment were introduce and the optical transmittance

absorption and laser induced damage threshold of a HfO

thin film sample at 355 nm were measured before and after the treatments. The treatment results on reducing absorption and improving the LIDT by above two post-treatment methods were compared

and their working principles were discussed. The experiments demonstrate that laser treatment decreases the sample absorption and improves the LIDT of HfO

thin films. With one step (50% LIDT)

the LIDT of the HfO

film at 355 nm increases from 13 J/cm

to 15 J/cm

. With two steps (50% LIDT and 80% LIDT)

the LIDT of the HfO

film at 355 nm increases from 13 J/cm

to 17.5 J/cm

and the damage probability curve translates to a high flux area wholly.

关键词

Keywords

references

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Effects of posttreatments on optical properties and laser induced damage thresholds of HfO2 thin films

DOI：10.3788/OPE.20162412.3000

摘要

Abstract

关键词

Keywords

references

Effects of posttreatments on optical properties and laser induced damage thresholds of HfO₂ thin films