Electrostatic field assisted micro imprint lithography technology

Min-zhe LIU; Tai-sheng WANG; He-fu LI; Zhen-yu LIU; Zuo-long CHEN; Wei-xing YU

doi:10.3788/OPE.20172503.0663

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Electrostatic field assisted micro imprint lithography technology

更新时间：2020-07-07

- Electrostatic field assisted micro imprint lithography technology
- Optics and Precision Engineering Vol. 25, Issue 3, Pages: 663-671(2017)
- 作者机构：
  
  1.中国科学院长春光学精密机械与物理研究所, 吉林长春 130033
  2.中国科学院大学, 北京 100049
  3.中国人民解放军63861部队, 吉林白城 137001
  4.中国科学院西安光学精密机械研究所, 陕西西安 710119
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20172503.0663
  CLC： O359+.1;O442
- Received：20 September 2016，
  
  Accepted：27 October 2016，
  
  Published：25 March 2017
- 稿件说明：
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Min-zhe LIU, Tai-sheng WANG, He-fu LI, et al. Electrostatic field assisted micro imprint lithography technology[J]. Optics and precision engineering, 2017, 25(3): 663-671.
DOI：

Min-zhe LIU, Tai-sheng WANG, He-fu LI, et al. Electrostatic field assisted micro imprint lithography technology[J]. Optics and precision engineering, 2017, 25(3): 663-671. DOI： 10.3788/OPE.20172503.0663.

摘要

介绍了一种静电场辅助的新型微压印光刻技术，并对其工艺过程进行了深入的理论研究。首先，采用数值仿真软件COMSOL

Multiphysics，建立了静电场辅助的压印光刻瞬态仿真分析模型，讨论了不同时域微结构的演化过程。然后，详细分析了微结构的成型与仿真实验参数的定性关系，发现：适当地减小极板间距、模板凸起结构周期，同时增加模板的凸起高度、初始聚合物薄膜厚度和电压有助于微纳结构的成型。最后，通过仿真实验参数优化，得到了带有31

m中空结构的球冠微结构。与传统压印方法相比，静电场辅助的微压印技术工艺过程简单且成本较低，能够广泛应用于微电子机械系统、光子学、遗传学和组织系统等。

Abstract

In this paper

a new type of micro imprint lithography assisted by electrostatic field was introduced

and an in-depth theoretical research was conducted on its technological process. First

numerical simulation software (COMSOL

Multiphysics) was adopted to establish a transient simulation model for electrostatic filed assisted imprint lithography and discussed the evolution process of micro structure in different time domains. Then a detailed analysis was conducted on the qualitative relationship between the micro structure formation and simulation experiment parameters

during which it was found that properly reducing the polar plate spacing

template bulging period and increasing the bulging height

initial polymer film thickness and voltage were beneficial to formation of the micro-nano structure. Finally

a spherical cap micro structure with 31

m hollow structure was obtained through optimization of the simulation experiment parameters. Compared with traditional imprint method

the electrostatic field assisted micro imprint

which is characterized by simple process and lower cost

can be widely applied to the micro electronic and mechanical system

photonics

genetics and tissue system etc.

关键词

Keywords

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