On-line dynamic interference stitching measurement system for large optical elements

Ying-jie YU; Te QI; Xin WU

doi:10.3788/OPE.20172507.1764

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On-line dynamic interference stitching measurement system for large optical elements

Modern Applied Optics | 更新时间：2020-07-07

- On-line dynamic interference stitching measurement system for large optical elements
- Optics and Precision Engineering Vol. 25, Issue 7, Pages: 1764-1770(2017)
- 作者机构：
  
  上海大学机电工程及自动化学院, 上海 200072
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20172507.1764
  CLC： TH74;TH703
- Received：19 January 2017，
  
  Accepted：16 March 2017，
  
  Published：25 July 2017
- 稿件说明：
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Ying-jie YU, Te QI, Xin WU. On-line dynamic interference stitching measurement system for large optical elements[J]. Optics and precision engineering, 2017, 25(7): 1764-1770.
DOI：

Ying-jie YU, Te QI, Xin WU. On-line dynamic interference stitching measurement system for large optical elements[J]. Optics and precision engineering, 2017, 25(7): 1764-1770. DOI： 10.3788/OPE.20172507.1764.

摘要

为了满足车间条件下大口径光学元件的高精度在位、在线检测的迫切需求，本文构建了一个适于一般环境下应用的动态干涉拼接测量实验系统。该系统由动态干涉仪、二维移动平台、控制系统及拼接软件等部分构成。应用该系统对200 mm×300 mm×20 mm的光学元件在一般应用环境下进行了拼接测量实验，采用误差均化拼接算法进行拼接，并对拼接后的结果进行分析处理，比较拼接测量与全口径测量结果，PV值的相对误差为3.1%，RMS值的相对误差为1.6%，Power值的相对误差为2.1%。该系统为在车间环境下建立大口径光学元件在位检测建立了基础。

Abstract

In order to realize on-line and in-situ measurement of high precision optical elements in workshop

a dynamic interference stitching system for large optical elements measured in general environment was investigated. The system was consisted of a dynamic interferometer

two-dimensional mobile platform

control system and stitching software. A stitching experiment for an 200 mm×300 mm optical element was completed by this system in general environment

based on error averaging stitching algorithm. Moreover

the stitching results were analyzed. Comparing the results between stitching measurement and full aperture measurement

the relative deviations of PV

RMS and Power are 3.1%

1.6% and 2.1% respectively. The system lays a foundation for the on-line and in-situ measurement system for large optical elements in the workshop environment.

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references

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