Fabrication of diffractive X-ray optics and their performance characterization

Yi-fang CHEN

doi:10.3788/OPE.20172511.2779

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Fabrication of diffractive X-ray optics and their performance characterization

X-ray Optics | 更新时间：2020-07-07

- Fabrication of diffractive X-ray optics and their performance characterization
- Optics and Precision Engineering Vol. 25, Issue 11, Pages: 2779-2795(2017)
- 作者机构：
  
  复旦大学信息科学与工程学院专项集成线路与系统国家重点实验室, 上海 200433
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20172511.2779
  CLC： TN305.7;O436.3
- Received：28 April 2017，
  
  Accepted：12 May 2017，
  
  Published：25 November 2017
- 稿件说明：
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Yi-fang CHEN. Fabrication of diffractive X-ray optics and their performance characterization[J]. Optics and precision engineering, 2017, 25(11): 2779-2795.
DOI：

Yi-fang CHEN. Fabrication of diffractive X-ray optics and their performance characterization[J]. Optics and precision engineering, 2017, 25(11): 2779-2795. DOI： 10.3788/OPE.20172511.2779.

摘要

综述了国内外在纳米加工X射线衍射光学透镜方面的研究现状和最新进展。介绍了作者团队过去三年在这方面做的工作。针对衍射透镜关键技术，研发了具有大高宽比形貌的电子束光刻基础工艺；结合金电镀，提出了纳米尺度波带片的制造技术，并将该工艺成功扩展于分辨率板（Siemens star）和集成光栅型会聚透镜的研制。运用蒙特卡罗模拟和显影动力学，探索了电子束光刻技术所能够实现~100 nm的波带片透镜（其中，100 nm波带片高宽比为16：1）、50~300 nm的分辨率测试板（其中，300 nm测试板高宽比为10：1）和200 nm的会聚透镜（高宽比为10：1）。对所研制的光学部件在同步辐射光源进行了实验表征。结果表明，100 nm波带片聚焦斑尺寸为234 nm，测试板和会聚透镜的光学特性与国外同样光学部件到达同等水平；会聚透镜辐照的均匀性为99%。最后，总结了近几年我国X射线衍射透镜的发展进度，指出了衍射光学部件光学性能发展的最大瓶颈是分辨率与衍射效率相互制约，提出了提高光学部件衍射效率的具体途径，给出了我国X射线衍射透镜技术的未来发展路线图。

Abstract

The present status and recent advances in nanofabrication of X-ray diffractive lenses in domestic and overseas were reviewed. The research and achievements of in the past three years by author's group were introduced. For the key technology of diffractive lenses

the basic processes of electron beam lithography for large aspect ratio profiles in resists was established. By combing with Au electroplating

a solid technical background for nanoscale zone plates was successfully built up and applied to the fabrications of Siemens stars and grating based beam shapers. Furthermore

by applying Monte Carlo simulation and developing dynamics

the aspect ratio (zone height/zone width)limit by electron beam lithography was explored and the physical essence leading to the limit was discussed. A serial of diffractive lenses

such as 50-100 nm zone plates (in which the 100 nm zone plate shows its aspect ratio of 16:1)

50-300 nm Siemens stars(in which the 300 nm Siemens star has the aspect ratio of 10:1)and 200 nm grating based condensers(with the aspect ratio of 10:1)were successfully fabricated. The optical characterizations of these fabricated lenses were measured in Shanghai Light Source

It demonstrates that the focusing spot of 100 nm zone plate is 234 nm. The 300 nm Siemens stars and the condensers fabricated in this work show their optical quality at the world level. The standard deviation of the illuminated intensity is measured to be 1%. Finally

this paper summarizes the development of X-ray diffraction lenses in our country in recent years

and points out that the biggest bottleneck of the development of diffraction optics is the interaction between resolution and diffraction efficiency. It puts forward some specific ways to improve the diffraction efficiency of optics and gives a technical road-map for the lens technique in China in the next five years.

关键词

Keywords

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