KB mirror system of X-ray photo-emission electron microscope beamline

Jia-hua CHEN; Xue-peng GONG; Song XUE; Qi-peng LU; Zhong-qi PENG; Yuan SONG; Yi WANG

doi:10.3788/OPE.20172511.2810

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KB mirror system of X-ray photo-emission electron microscope beamline

X-ray Optics | 更新时间：2020-07-07

- KB mirror system of X-ray photo-emission electron microscope beamline
- Optics and Precision Engineering Vol. 25, Issue 11, Pages: 2810-2816(2017)
- 作者机构：
  
  1.中国科学院上海应用物理研究所, 上海 201800
  2.中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室, 吉林长春 130033
  3.中国科学院大学, 北京 100049
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20172511.2810
  CLC： TH742.9;TN305.7
- Received：27 March 2017，
  
  Accepted：08 May 2017，
  
  Published：25 November 2017
- 稿件说明：
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Jia-hua CHEN, Xue-peng GONG, Song XUE, et al. KB mirror system of X-ray photo-emission electron microscope beamline[J]. Optics and precision engineering, 2017, 25(11): 2810-2816.
DOI：

Jia-hua CHEN, Xue-peng GONG, Song XUE, et al. KB mirror system of X-ray photo-emission electron microscope beamline[J]. Optics and precision engineering, 2017, 25(11): 2810-2816. DOI： 10.3788/OPE.20172511.2810.

摘要

研制了光发射电子显微镜（PEEM）高精度微聚焦系统，以实现上海光源软X射线PEEM光束线的高质量聚焦。根据上海光源PEEM光束线的概况，给出微聚焦系统光学元件的基本参数。基于Kirkpatrick-Baez（KB镜）两镜方案，设计了PEEM线微聚焦系统。介绍了KB镜姿态调整机构的设计方案，即利用三垂直线性驱动装置和两水平线性驱动装置相结合来实现五维调节，分析了姿态调节机构的原理与工作过程，给出了微聚焦系统的整体设计方案。测试了KB镜系统的机械性能，给出水平调节机构以及第一面镜子Pitch运动的测试结果，结果显示：水平调节机构分辨率为0.6 μm，重复精度为0.85 μm，Pitch角度分辨率为0.4"，重复精度为0.5"，优于指标要求。其它参数的测试结果亦均优于指标要求。实验表明，微聚焦系统机械指标的实现保证了PEEM线光斑的高质量聚焦。

Abstract

A high accuracy micro-focusing system was designed to improve the light spot focusing quality of the X-ray beam-line for Photo-emission Electron Microscope (PEEM) in Shanghai Synchrotron Radiation Facility(SSRF). The layout of PEEM beam-line of the SSRF was introduced and basic parameters of optics of the micro-focusing system were presented. Two Kirkpatrick-Baez mirrors (KB mirror) were adopted to finish the design of micro-focusing system. The design scheme of a key component-posture adjusting mechanism in the system was introduced. Namely

a three vertical linear driving equipment and a two horizontal linear driving device were combined to implement five-dimensional adjustment of the system. The working principle and process of the posture adjusting mechanism were introduced

and the overall design scheme of micro-focusing system were analyzed deeply. The mechanical performance of KB mirror system was tested

and the testing results of the horizontal adjusting mechanism and the pitch motion of first mirror were given. That the resolution and repeat accuracy of horizontal adjusting mechanism are 0.6 μm and 0.85 μm respectively

and those of pitch motion are 0.4" and 0.5" respectively

which are better than that of the technical requirements. The other parameters were tested as well

and the results also satisfy the technical requirements. The realization of technical targets of KB mirror system guarantees the high quality focusing of PEEM bean-line.

关键词

Keywords

references

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Laboratory of X-ray Optics and Technologies, Beijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences

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