Fabrication of PMMA hard X-ray compound Kinoform lenses

Jing LIU; Fu-ting YI; Wei-fan SHENG; Guang-cai CHANG; Wei-wei ZHANG

doi:10.3788/OPE.20172511.2817

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Fabrication of PMMA hard X-ray compound Kinoform lenses

X-ray Optics | 更新时间：2020-07-07

- Fabrication of PMMA hard X-ray compound Kinoform lenses
- Optics and Precision Engineering Vol. 25, Issue 11, Pages: 2817-2822(2017)
- 作者机构：
  
  中国科学院高能物理研究所, 北京 100049
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20172511.2817
  CLC： O434.19;TN305.7
- Received：22 March 2017，
  
  Accepted：27 April 2017，
  
  Published：25 November 2017
- 稿件说明：
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Jing LIU, Fu-ting YI, Wei-fan SHENG, et al. Fabrication of PMMA hard X-ray compound Kinoform lenses[J]. Optics and precision engineering, 2017, 25(11): 2817-2822.
DOI：

Jing LIU, Fu-ting YI, Wei-fan SHENG, et al. Fabrication of PMMA hard X-ray compound Kinoform lenses[J]. Optics and precision engineering, 2017, 25(11): 2817-2822. DOI： 10.3788/OPE.20172511.2817.

摘要

为提高硬X射线聚焦元件的聚焦性能，利用LIGA（Lithographie，Galvanoformung，Abformung）技术，制备了深度为60 μm的聚甲基丙烯酸甲酯（PMMA）材质硬X射线组合Kinoform透镜（CKL），并获得了良好的面形。制备的CKL以宽度为几个微米的细窄线条为主要结构，包括曲面和直角面形，线条最窄宽度为2 μm。为保证CKL良好的曲面及直角结构，样品制备分为三部分：过渡掩模板的制备，LIGA掩模板的制备，以及最终样品的硬X射线曝光制备。在LIGA掩模板制备过程中，采用制备有纳米柱阵列的硅衬底有效解决了光刻胶脱胶的问题。在最终样品制备过程中，选用分子量较高的PMMA片作衬底，提高了PMMA刚度，有效缓解了细窄线条的倒塌黏连问题，保证了CKL的良好面形。在北京同步辐射光源（BSRF）成像站测试了CKL透镜的性能，结果显示其对于8 keV的X射线，聚焦焦斑的半高全宽（FWHM）为440 nm。

Abstract

To improve the focusing performance of hard X-ray focusing elements

a hard X-ray Compound Kinoform Lens (CKL) based on Polymethyl methacrylate (PMMA) with a depth of 60 μm is fabricated by LIGA(Lithographie

Galvanoformung

Abformung)technology

and its excellent morphology is obtained. The main structure of CKL is a narrow pattern with a few micron widths

including the curve and the rectangular surfaces

and the width of the narrowest pattern is only 2 μm. The fabrication of the CKL is divided into three parts to ensure its excellent morphology:the transitional mask preparation

LIGA mask preparation

and hard X-ray exposure to get the finial samples. The nanopillar arrays on silicon substrate are used to solve the falling-off problem of the photoresist during the LIGA mask preparation. Then the PMMA sample with a high molecular weight is selected as the substrate to improve the rigidity of the PMMA and to relieve the adhesion and collapse of the narrow pattern in the final sample preparation. The focusing performance of CKL is tested at X-ray microscope beam-line of Beijing Synchrotron Radiation Facility (BSRF). The experiment result for an 8 keV X-ray at transmission shows its full-width-at-half-maximum (FWHM) peak size for focusing spot is 440 nm.

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references

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