Laser direct writing for binary patterns during accelerating and decelerating motion of scanning stage

Shan ZHANG; Lei WANG; Ying-jun LÜ

doi:10.3788/OPE.20182603.0531

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Laser direct writing for binary patterns during accelerating and decelerating motion of scanning stage

Modern Applied Optics | 更新时间：2020-07-05

- Laser direct writing for binary patterns during accelerating and decelerating motion of scanning stage
- Optics and Precision Engineering Vol. 26, Issue 3, Pages: 531-540(2018)
- 作者机构：
  
  1.山东科技大学电气信息系, 山东济南 250031
  2.哈尔滨工业大学超精密光电仪器工程研究所, 黑龙江哈尔滨 150001
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20182603.0531
  CLC： TN249
- Received：10 August 2017，
  
  Accepted：15 September 2017，
  
  Published：25 March 2018
- 稿件说明：
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Shan ZHANG, Lei WANG, Ying-jun LÜ. Laser direct writing for binary patterns during accelerating and decelerating motion of scanning stage[J]. Optics and precision engineering, 2018, 26(3): 531-540.
DOI：

Shan ZHANG, Lei WANG, Ying-jun LÜ. Laser direct writing for binary patterns during accelerating and decelerating motion of scanning stage[J]. Optics and precision engineering, 2018, 26(3): 531-540. DOI： 10.3788/OPE.20182603.0531.

摘要

为了进一步提高直角坐标激光的直写效率，提出了一种扫描工作台各速度段进行激光直写二元图案的方法。该方法用扫描工作台的位置反馈脉冲同步触发激光束曝光光刻胶，实现像素点的理想位置曝光；而且依据扫描工作台的运动特性和匀速直写时各像素点获得的曝光量情况，对处于扫描工作台加、减速度段的像素点的曝光强度进行调制，保证需要曝光的像素点对应的每一个位移分辨力距离上所获的曝光量与扫描工作台匀速运动时相同，从而保证扫描工作台速度连续变化的情况下激光直写能获得预期的曝光效果。仿真实验表明：以5 mm×5 mm曝光图案为例，该方法所需的直写时间是传统只在匀速段直写的77.77%；同时配备的声光调制器由16位降为12位时，扫描工作台整个加速段直写产生的曝光量相对误差由0.4%上升为10%。

Abstract

In order to further improve the efficiency of laser direct writing (LDW) in Cartesian coordinates

the exposure process was proposed to proceed in the accelerating and decelerating sections of the scanning stage

while the exposure effect was guaranteed by the following two ways. The pixel exposure data stored in a line buffer were clocked out by the position feedback pulses during the line scan

driving the acousto-optic modulator to obtain the corresponding beam intensity at the exact desired position. According to the kinetic characteristic of scanning stage

the necessary exposure data under uniform motion and minimum exposure intensity

and exposure data of each pixel in the accelerating and decelerating sections of the scanning stage

are modulated to make the distance of each displacement resolution in it exposed as much dose as that in uniform sections. Numerical simulations indicate that

considering an exposure pattern within a 5 mm×5 mm area as an example

the total exposure time with the proposed method is 77.77% of that with exposure only during the scanning stage moving at a constant speed. Meanwhile

the relative error of the exposure dose is increased from 0.4% to 10% when the bit of the acousto-optic modulator is decreased from 16 to 12.

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references

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哈尔滨工业大学超精密光电仪器工程研究所

Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences

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