Calculating the influence matrix between surface error and wavefront aberration is a key step in the Ritchey-Common test. A method that uses unit-excitation operation to calculate the influence matrix with high accuracy was studied in order to improve the precision of the test. It retrieves the system wavefront aberration when the flat mirror concludes only one kind of Zernike aberration
and obtains the influence coefficient vector through Zernike fitting. The influence matrix is formed from the coefficient vectors of all the Zernike aberrations. Least square fitting is then used to reconstruct the surface shape of the tested mirror. After reconstructing the wavefront with Ritchey angles of 26.5° and 40.5°
the test results show PV and RMS values of 0.1413λ and 0.0194λ respectively for the
Φ
90 mm flat mirror. Compared to the results from direct testing
the PV and RMS error in the Ritchey-Common method are 0.0828λ and 0.0109λ
respectively. This method can calculate the influence matrix accurately
eliminate the dependence on the big
F
-number in traditional influence matrix methods and can reconstruct the surface shape with high precision.
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Related Author
ZHAO Weiqian
QIU Lirong
CUI Jian
YANG Zheng
YANG Shuai
ZHAO Jiahao
Shuai LOU
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Related Institution
MIIT Key Laboratory of Complex-field Intelligent Exploration,School of Optics and Photonics,Beijing Institute of Technology
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Department of Materials Science and Engineering, University of California, Berkeley
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences