In order to solve the problem of producing large-size and wafer-level composite flexible mold at low cost and high throughput for the large area NIL
this paper systematically investigated the theoretical model
numerical simulation and fabrication method for a large-size and wafer-level composite flexible mold with double-layer structures. Two models regarding the peel off demolding and the air bubble defects generated were proposed. Furthermore
the influence factors and laws of the peel demolding parameters for separating the replicated composite mold and the master mold were revealed by numerical simulation by using ABAQUS software. A manufacturing approach was presented to replicate the large size and wafer-level flexible mold with two-layer structures. Finally
a 4 inch full-wafer composite flexible mold was fabricated by using the proposed method and a 10.16 cm(4 inch) Si master. The studies in the paper are valuable in providing a theoretical basis for fabricating large-size and wafer-level composite mold
and offer a feasible and effective method to replicate large-size and wafer-level composite mold with low cost and high quality.
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references
TRAUB M C, LONGSINE W, TRUSKETT V N. Advances in nanoimprint lithography[J]. Annual Review of Chemical and Biomolecular Engineering, 2016, 7:583-604.
JAIN A, SPANN A, COCHRANE A, et al.. Fluid flow in UV nanoimprint lithography with patterned templates[J]. Microelectronic Engineering, 2017, 173:62-70.
LAN H B, DING Y CH, LIU H ZH. Nanoimprint Lithography:Principles, Processes and Materials[M]. New York:Nova Science Publishers, 2011.
LIU M ZH, WANG T SH, LI H F, et al.. Electrostatic field assisted micro imprint lithography technology[J]. Opt. Precision Eng., 2017, 25(3):663-671. (in Chinese)
YAMADA Y, ITO K, MIURA A, et al.. Simple and scalable preparation of master mold for nanoimprint lithography[J]. Nanotechnology, 2017, 28(20):205303.
KOYAMA M, SHIRAI M, KAWATA H, et al.. Computational study on UV curing characteristics in nanoimprint lithography:stochastic simulation[J]. Japanese Journal of Applied Physics, 2017, 56(6S1):06GL03.
WU D J, XU Y, WANG X Y, et al.. Experimental and theoretical study on laser cleaning Al2O3 particle on silicon wafer surface[J]. Opt. Precision Eng., 2006, 14(5):764-770. (in Chinese)
周伟民.纳米压印技术[M].北京:科学出版社, 2011.
ZHOU W M. Nanoimprint Technology[M]. Beijing:Science Press, 2011. (in Chinese)
POPOV V L. Contact Mechanics and Friction:Physical Principles and Applications[M]. Berlin, Heidelberg:Springer, 2010.
AHN S H. High-throughput , continuous nanopatterning technologies for display and energy applications [D]. Michigan: University of Michigan, 2010.
LIU J, SHAO Y M, QIN X M, et al.. Dynamic modeling on localized defect of cylindrical roller bearing based on non-Hertz line contact characteristics[J]. Journal of Mechanical Engineering, 2014, 50(1):91-97.
PLACHETKA U, BENDER M, FUCHS A, et al.. Comparison of multilayer stamp concepts in UV-NIL[J]. Microelectronic Engineering, 2006, 83(4-9):944-947.
BHAGA D, WEBER M E. Bubbles in viscous liquids:shapes, wakes and velocities[J]. Journal of Fluid Mechanics, 1981, 105:61-85.
LAN H B, LIU H ZH. UV-nanoimprint lithography:structure, materials and fabrication of flexible molds[J]. Journal of Nanoscience and Nanotechnology, 2013, 13(5):3145-3172.
LI Z H, LAN H B, LIU H ZH, et al.. Theory and simulations of peel demolding for large-area nanoimprint lithography[J]. Scientia Sinica Technologica, 2014, 44(10):1087-1096. (in Chinese)