Research of scanning slit with minimal penumbra of blade's edge in lithography

Dong-liang LIN; Fang ZHANG; Hui-jie HUANG

doi:10.3788/OPE.20182605.1046

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Research of scanning slit with minimal penumbra of blade's edge in lithography

Modern Applied Optics | 更新时间：2020-08-13

- Research of scanning slit with minimal penumbra of blade's edge in lithography
- Optics and Precision Engineering Vol. 26, Issue 5, Pages: 1046-1053(2018)
- 作者机构：
  
  1.中国科学院上海光学精密机械研究所信息光学与光电技术试验室, 上海 201800
  2.中国科学院大学, 北京 100049
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20182605.1046
  CLC： TN23;TN305.7
- Received：10 October 2017，
  
  Accepted：06 December 2017，
  
  Published：25 May 2018
- 稿件说明：
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Dong-liang LIN, Fang ZHANG, Hui-jie HUANG. Research of scanning slit with minimal penumbra of blade's edge in lithography[J]. Optics and precision engineering, 2018, 26(5): 1046-1053.
DOI：

Dong-liang LIN, Fang ZHANG, Hui-jie HUANG. Research of scanning slit with minimal penumbra of blade's edge in lithography[J]. Optics and precision engineering, 2018, 26(5): 1046-1053. DOI： 10.3788/OPE.20182605.1046.

摘要

扫描狭缝是步进扫描光刻机中控制曝光剂量的重要单元，而扫描狭缝产生过大的刀口半影会影响曝光性能。首先，根据步进扫描光刻机照明原理，通过分析掩模面上光强分布与扫描狭缝刀口厚度及位置的相对关系，推导出掩模面上刀口半影宽度的计算公式，同时针对数值孔径NA为0.75的光刻机照明系统模型分别对非共面和共面扫描狭缝在掩模面上的刀口半影进行仿真分析；研制了一种四刀口共面的高精度扫描狭缝装置，不仅满足步进扫描光刻机的同步性能需求，并且有效减小了

向和

向的刀口半影；最后对所研制的扫描狭缝动态性能以及掩模面上实际刀口半影进行了测试。结果表明，当最大扫描速度达到470 mm/s时，扫描刀口动态跟随误差始终在±30 μm以内，同时两个方向的刀口半影均不超过0.5 mm，满足90 nm分辨率步进扫描光刻机的需求。

Abstract

Scanning slit is an important element for controlling exposure dose in step-and-scan lithography. Too large a penumbra of the blade's edge in scanning slit could affect the exposure performance. Firstly

according to the illumination principle of a step-and-scan lithography

the calculation formula of the penumbra of the blade's edge at the reticle plane was derived by analyzing the relationship between the intensity distribution of the reticle and the thickness and location of the blades in the scanning slit. The theoretical value of the penumbra of the coplanar and noncoplanar blade's edges at the reticle plane was verified using the simulating light model of a 0.75 NA lithography. Secondly

a high-accuracy scanning slit apparatus with four coplanar blades was developed

which not only meets the synchronization performance requirements of the step-and-scan lithography

but also reduces the penumbra of the blade's edges in the

and

-direction. Finally

the dynamic performance of the scanning blades and the actual penumbra of the blade's edges at the reticle plane were also experimentally tested. The test results indicate that when the scanning speed reaches 470 mm/s

the dynamic position error of the blade is within ±30 μm and the penumbra of all edges does not exceed 0.5 mm and meets the requirements of the 90 nm step-and-scan lithography.

关键词

Keywords

references

张强, 胡松, 姚汉民, 等. ASML公司光学光刻技术最新进展[J].微细加工技术, 2002(3):8-11, 27.

ZHANG Q, HU S, YAO H M, et al.. Current progress of optical lithography in ASML[J]. Microfabrication Technology, 2002(3):8-11, 27. (in Chinese)

FAY B. Advanced optical lithography development, from UV to EUV[J]. Microelectronic Engineering, 2002, 61-62:11-24.

袁琼雁, 王向朝.国际主流光刻机研发的最新进展[J].激光与光电子学进展, 2007, 44(1):57-64.

YUAN Q Y, WANG X ZH. Recent development of international mainstream lithographic tools[J]. Laser & Optoelectronics Progress, 2007, 44(1):57-64. (in Chinese)

巩岩, 张巍. 193 nm光刻曝光系统的现状及发展[J].中国光学与应用光学, 2008, 1(1):25-35.

GONG Y, ZHANG W. Present status and progress in 193 nm exposure system in lithography[J]. Chinese Journal of Optics and Applied Optics, 2008, 1(1):25-35. (in Chinese)

MATSUYAMA T, OHMURA Y, WILLIAMSON D M. The lithographic lens:its history and evolution[J]. SPIE, 2006, 6154:24-37.

LIM C M, KIM S, PARK J T, et al.. Study on CD variation in the vicinity of the exposure field edge in EUV lithography[J]. SPIE, 2012, 8322:832210.

ZHANG Y B, ZENG A J, WANG Y, et al.. Illumination system without scanning slit for lithographic tools[J]. SPIE, 2014, 9052:90522H.

CARTER F M, GALBURT D N, ROUX S, et al. . Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion: US, 6906789 B2[P]. 2005-06-14.

DU MEE M P D, BUIS E J, VERWEIJ A H, et al. . Lithographic apparatus, reticle masking device for a lithographic apparatus, gas bearing and apparatus comprising such gas bearing: US, 7307689 B2[P]. 2007-12-11.

BINNARD M B, WATSON D C, MARGESON C S. Iron core motor driven automatic reticle blind: US, 7692768 B2[P]. 2010-04-06.

ZHANG F, ZHU J, YUE W R, et al.. An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography[J]. Optics Express, 2015, 23(4):4482-4493.

ZHANG F, ZHU J, SONG Q, et al.. Reducing aberration effect of Fourier transform lens by modifying Fourier spectrum of diffractive optical element in beam shaping optical system[J]. Applied Optics, 2015, 54(30):8891-8898.

HU ZH H, ZHU J, YANG B X, et al.. Test of diffractive optical element for DUV lithography system using visible laser[J]. SPIE, 2012, 8557:855709.

CHEN M, CHEN L Q, ZENG A J, et al.. Generation of trapezoidal illumination for the step-and-scan lithographic system[J]. Applied Optics, 2015, 54(22):6820-6826.

CHEN M, WANG Y, ZENG A H, et al.. Flat Gauss illumination for the step-and-scan lithographic system[J]. Optics Communications, 2016, 372:201-209.

刘孝宁, 马世光.铍铝合金的研究与应用[J].稀有金属, 2003, 27(1):62-65.

LIU X N, MA SH G. Study and application of AlBe alloy[J]. Chinese Journal of Rare Metals, 2003, 27(1):62-65. (in Chinese)

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