Fabrication and application of dual-wavelength infrared transmission-type interferometer

Zhi-liang ZHAO; Li-hua CHEN; Zi-jia ZHAO; Jie LIU; Min LIU

doi:10.3788/OPE.20182611.2639

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Fabrication and application of dual-wavelength infrared transmission-type interferometer

Modern Applied Optics | 更新时间：2020-07-05

- Fabrication and application of dual-wavelength infrared transmission-type interferometer
- Optics and Precision Engineering Vol. 26, Issue 11, Pages: 2639-2646(2018)
- 作者机构：
  
  1.成都太科光电技术有限责任公司, 四川成都 610041
  2.成都精密光学工程研究中心, 四川成都 610041
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20182611.2639
  CLC： TH744.3
- Received：10 February 2018，
  
  Accepted：30 March 2018，
  
  Published：25 November 2018
- 稿件说明：
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Zhi-liang ZHAO, Li-hua CHEN, Zi-jia ZHAO, et al. Fabrication and application of dual-wavelength infrared transmission-type interferometer[J]. Optics and precision engineering, 2018, 26(11): 2639-2646.
DOI：

Zhi-liang ZHAO, Li-hua CHEN, Zi-jia ZHAO, et al. Fabrication and application of dual-wavelength infrared transmission-type interferometer[J]. Optics and precision engineering, 2018, 26(11): 2639-2646. DOI： 10.3788/OPE.20182611.2639.

摘要

采用635 nm波长半导体可见光激光和10.5 μm波长半导体红外激光作为干涉光源，设计了635 nm和10.5 μm双波段共光路透射式红外干涉仪，实现了可见光波段干涉测试与红外光波段干涉测试共光路，且双光路共用可见光对准。双波段共用机械式相移系统，并采用635 nm测试光分段驻点标定10.5 μm测试时相移器的长行程误差。研制的双波长红外干涉仪系统的红外测试精度达到PV优于0.05

，RMS优于0.02

，系统重复性RMS优于0.001

。采用该干涉仪测试口径为400 mm×400 mm，离轴量为800 mm的离轴非球面，得到边缘最大偏差值为21.9 μm，能够实现大口径离轴非球面从粗磨到精磨高精度加工面形的全过程干涉测试。

Abstract

A 635 nm and 10.5 μm dual-band coherent optical infrared transmission interferometer was designed. This integrated system employs a visible semiconductor laser at 635 nm and an infrared semiconductor laser at 10.5 μm as the interference light source. Through tests with this integrated system

a common optical path between the interference of the visible light band and the infrared light band could be determined. The common mode of the mechanical phase shift system and the visible light co-alignment were used in the dual-band optical path

and the phase shifter long-stroke error was calibrated at 10.5 μm based on the segment stagnation point of the 635 nm testing light. The accuracy of the developed dual-wavelength infrared interferometer system was measured

where the values of PV

RMS

and RMS repeatability were better than 0.05

0.01

and 0.001

respectively. The interferometer was used to test an aspherical mirror with off-axis amount of 800 nm and dimensions of 400 mm×400 mm

where the maximum deviation of the measured edge value is 21.9 μm. Furthermore

the interferometer enables high-accurate surface measurements during the entire grinding process of large-aperture off-axis aspheric components.

关键词

Keywords

references

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