Influence of plasma treatment on optical and damage properties of TiO<sub>2</sub> thin films

Si-da MAO; Yong-gang ZOU; Jie FAN; Yun-ping LAN; Hai-zhu WANG; Jia-bin ZHANG; Jia-ning DONG; Xiao-hui MA

doi:10.3788/OPE.20192707.1451

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Influence of plasma treatment on optical and damage properties of TiO₂ thin films

Modern Applied Optics | 更新时间：2020-08-13

- Influence of plasma treatment on optical and damage properties of TiO₂ thin films
- Optics and Precision Engineering Vol. 27, Issue 7, Pages: 1451-1457(2019)
- 作者机构：
  
  长春理工大学高功率半导体激光国家重点实验室, 吉林长春 130022
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20192707.1451
  CLC： O484.4
- Received：27 November 2018，
  
  Accepted：06 January 2019，
  
  Published：15 July 2019
- 稿件说明：
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Si-da MAO, Yong-gang ZOU, Jie FAN, et al. Influence of plasma treatment on optical and damage properties of TiO₂ thin films[J]. Optics and precision engineering, 2019, 27(7): 1451-1457.
DOI：

Si-da MAO, Yong-gang ZOU, Jie FAN, et al. Influence of plasma treatment on optical and damage properties of TiO₂ thin films[J]. Optics and precision engineering, 2019, 27(7): 1451-1457. DOI： 10.3788/OPE.20192707.1451.

摘要

为了进一步提高TiO

薄膜的光学特性和激光损伤阈值

采用电子束蒸发技术在K9玻璃上沉积了单层TiO

薄膜

并用Ar/O混合等离子体对样品进行后处理。通过研究薄膜光谱特性、表面缺陷密度、薄膜表面形貌、薄膜损伤阈值以及薄膜损伤形貌

分析了等离子体后处理时间对TiO

薄膜激光损伤特性的影响。实验结果表明

随着等离子体后处理时间的增加

薄膜折射率及致密度提高

物理厚度减少

表面粗糙度下降

表面缺陷密度先减少后增加; 在1 064 nm激光辐射下

TiO

薄膜的激光损伤阈值从未经等离子后处理的5.6 J/cm

提升至后处理20 min的9.65 J/cm

提升幅度高达72.3%

因此能够更广泛更稳定地应用在激光器中。

Abstract

To improve the optical properties and laser damage threshold of TiO

films and to ensure their wider use and greater stability in lasers

TiO

films were deposited on K9 glass using electron beam evaporation technology

and the samples were post-treated with Ar/O mixed plasma. The effects of plasma post-treatment time on the laser damage characteristics of TiO

thin films were analyzed by measuring the film spectral characteristics

surface defect density

surface topography

damage threshold

and damage topography. The experimental results showed that the refractive index and fill density of the films increased with increasing post-treatment time

whereas the physical thickness and surface roughness decreased. In addition

the surface defect density first decreased and then increased. After a 20-min post-treatment

the LIDT of the TiO

film samples increased from 5.6 to 9.65 J/cm

under a 1 064-nm laser irradiation

representing an increase of 72.3%.

关键词

Keywords

references

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Influence of plasma treatment on optical and damage properties of TiO2 thin films

DOI：10.3788/OPE.20192707.1451

摘要

Abstract

关键词

Keywords

references

Influence of plasma treatment on optical and damage properties of TiO₂ thin films