Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner

Lei-jie WANG; Ming ZHANG; Yu ZHU; Wei-nan YE; Fu-zhong YANG

doi:10.3788/OPE.20192709.1909

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Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner

更新时间：2020-08-13

- Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner
- Optics and Precision Engineering Vol. 27, Issue 9, Pages: 1909-1918(2019)
- 作者机构：
  
  清华大学机械工程系摩擦学国家重点实验室&精密超精密制造装备及控制北京市重点实验室, 北京 100084
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20192709.1909
  CLC： TH741
- Received：02 May 2019，
  
  Accepted：13 June 2019，
  
  Published：15 September 2019
- 稿件说明：
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Lei-jie WANG, Ming ZHANG, Yu ZHU, et al. Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner[J]. Optics and precision engineering, 2019, 27(9): 1909-1918.
DOI：

Lei-jie WANG, Ming ZHANG, Yu ZHU, et al. Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner[J]. Optics and precision engineering, 2019, 27(9): 1909-1918. DOI： 10.3788/OPE.20192709.1909.

摘要

超精密平面光栅编码器位移测量技术是32~7 nm节点浸没式光刻机的核心技术。通过分析浸没式光刻机平面光栅位置系统的需求和布局，提出了光刻机专用超精密平面光栅编码器的基本需求。针对现有的光栅编码器，开展了基本测量光路方案、相位探测方案、分辨率增强光路方案、离轴/转角允差光路方案、死程误差抑制光路方案的综述分析，提出了现有设计方案面向光刻机应用所需要解决的关键问题。面向亚纳米级测量精度的需求，针对光栅编码器的仪器误差，对周期非线性误差、死程误差、热漂移误差和波前畸变误差进行了综述分析，提出了平面光栅编码器实现亚纳米精度所需要解决的关键问题。本综述为光刻机专用超精密平面光栅编码器的研制提供了参考。

Abstract

The ultra-precision grid encoder is the key technology of the immersion lithography scanner for 32-7 nm node. Firstly

by analyzing the requirements and layout of the grid encoder position measurement system of the immersion lithography scanner

the basic requirement of a special grid encoder for the scanner is proposed. Secondly

for the present grating encoder

research on the basic optical path

phase detection

resolution multiplication

off-axis/rotation tolerance

and dead-path restrain scheme is reviewed and analyzed. Then

the key problems of the present scheme in the application of the lithography scanner are proposed. Thirdly

to address the required nanometer accuracy for the instrumental error of the grid encoder

the research on nonlinearity

dead-path

thermal drift

and wave-front distortion error are reviewed and analyzed; and the key problems to achieve sub-nanometer accuracy for the grid encoder are proposed. Finally

the above review is summarized

which can serve as a reference for the special grid encoder of immersion lithography scanner.

关键词

Keywords

references

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Related Institution

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