Li Yan, Xu Mai, Wang Shurong, Ma Changhong. Diffraction Monitoring Technique for FabriCating Photoresist Grating Masks[J]. Editorial Office of Optics and Precision Engineering, 1990,(3): 17-20
Li Yan, Xu Mai, Wang Shurong, Ma Changhong. Diffraction Monitoring Technique for FabriCating Photoresist Grating Masks[J]. Editorial Office of Optics and Precision Engineering, 1990,(3): 17-20DOI:
The optimum conditions for monitoring grooves and configurations of the photoresist grating masks are obtained by the observation of the negative first-order diffraction efficiency during development. This technique can be used for fabricating various waveguide gratings for integrated optics.