Yan Yiming, Wang Dachun, He Yejun, Yang Cungeng, Zhang Shengji, Liu Andong. A deep sub-micron X-ray lithography by using a soft parallel beam X-ray lens[J]. Editorial Office of Optics and Precision Engineering, 1995,(4): 62-65
Yan Yiming, Wang Dachun, He Yejun, Yang Cungeng, Zhang Shengji, Liu Andong. A deep sub-micron X-ray lithography by using a soft parallel beam X-ray lens[J]. Editorial Office of Optics and Precision Engineering, 1995,(4): 62-65DOI:
With combination of a parallel beam soft X-ray lens used as an X-ray beam collimatorand an electron gun soft X-ray generator
a parallel soft X-ray source was developed for deepsubmicron X-ray lithography in the X-ray laboratory of Beijing Normal university.A testinglithography experiment was carried out by using this source and 0.2—1.0μm lines wereobserved.The experimental setup and preliminary resuIts of X-ray lithography is describedbriefly in this report.